Thin solid lubricant film formation by fast atom bombardment sputter deposition

Hiroki Kuwano, Kazutoshi Nagai

Research output: Contribution to journalArticle

21 Citations (Scopus)

Abstract

A fast atom bombardment sputter deposition (FAB-SD) method is proposed for the formation of MOS2solid lubricant films and to control their stoichiometry. In the FAB-SD process, the charging of targets is not a serious problem. The beams in a Mcllraithtype ion source are demonstrated to be capable of almost full neutralization. An Mo-S complex target is used for the purpose of stoichiometric control in the sputtering. Durability and friction coefficients of films deposited using this target are superior to those of films deposited using a conventional MoS2target. The friction coefficient of the annealed film deposited using the Mo-S complex target is less than 0.05.

Original languageEnglish
Pages (from-to)1809-1812
Number of pages4
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume3
Issue number4
DOIs
Publication statusPublished - 1985 Jul
Externally publishedYes

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Fingerprint Dive into the research topics of 'Thin solid lubricant film formation by fast atom bombardment sputter deposition'. Together they form a unique fingerprint.

  • Cite this