TY - JOUR
T1 - Thin film filters for an EUV multilayer mirror optics with a laser produced plasma light source
AU - Harada, Tetsuo
AU - Hatano, Tadashi
N1 - Funding Information:
This research was partially supported by Grant-in-Aid for Specially Promoted Research, No. 15002001 from the Ministry of Education, Culture, Sports, Science and Technology, Japan. The spectral reflectances of the Mo/Si multilayer mirror were measured at the Photon Factory with the approval of the Photon Factory Program Advisory Committee (Proposal No. 2003G180). The authors express their sincere thanks to Prof. M. Yamamoto for his guidance and critically reading the manuscript.
PY - 2005/6
Y1 - 2005/6
N2 - For rejection of unwanted background component in the reflection spectrum of EUV multilayer mirrors, thin film transmission filters of Mo, Zr, and Be were evaluated with a laser produced plasma EUV source and an imaging plate detector. It is found that in addition to a standard Zr filter, a Mo filter has good rejection characteristics. In particular, for multilayer mirror use at a large angle of incidence such as the polarizing angles around 45°, Mo shows better rejection characteristics than Zr. It is also confirmed that Be transmits non-ignorable amount of UV background.
AB - For rejection of unwanted background component in the reflection spectrum of EUV multilayer mirrors, thin film transmission filters of Mo, Zr, and Be were evaluated with a laser produced plasma EUV source and an imaging plate detector. It is found that in addition to a standard Zr filter, a Mo filter has good rejection characteristics. In particular, for multilayer mirror use at a large angle of incidence such as the polarizing angles around 45°, Mo shows better rejection characteristics than Zr. It is also confirmed that Be transmits non-ignorable amount of UV background.
KW - EUV
KW - Imaging plate
KW - Laser produced plasma
KW - Thin film filter
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U2 - 10.1016/j.elspec.2005.01.042
DO - 10.1016/j.elspec.2005.01.042
M3 - Article
AN - SCOPUS:17444428117
VL - 144-147
SP - 1075
EP - 1077
JO - Journal of Electron Spectroscopy and Related Phenomena
JF - Journal of Electron Spectroscopy and Related Phenomena
SN - 0368-2048
ER -