Thin film filters for an EUV multilayer mirror optics with a laser produced plasma light source

Tetsuo Harada, Tadashi Hatano

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

For rejection of unwanted background component in the reflection spectrum of EUV multilayer mirrors, thin film transmission filters of Mo, Zr, and Be were evaluated with a laser produced plasma EUV source and an imaging plate detector. It is found that in addition to a standard Zr filter, a Mo filter has good rejection characteristics. In particular, for multilayer mirror use at a large angle of incidence such as the polarizing angles around 45°, Mo shows better rejection characteristics than Zr. It is also confirmed that Be transmits non-ignorable amount of UV background.

Original languageEnglish
Pages (from-to)1075-1077
Number of pages3
JournalJournal of Electron Spectroscopy and Related Phenomena
Volume144-147
DOIs
Publication statusPublished - 2005 Jun

Keywords

  • EUV
  • Imaging plate
  • Laser produced plasma
  • Thin film filter

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Radiation
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Spectroscopy
  • Physical and Theoretical Chemistry

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