Thin film filters for an EUV multilayer mirror optics with a laser produced plasma light source

Tetsuo Harada; Tadashi Hatano

doi:10.1016/j.elspec.2005.01.042

Thin film filters for an EUV multilayer mirror optics with a laser produced plasma light source

Tetsuo Harada, Tadashi Hatano

SR Core Research Division

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

For rejection of unwanted background component in the reflection spectrum of EUV multilayer mirrors, thin film transmission filters of Mo, Zr, and Be were evaluated with a laser produced plasma EUV source and an imaging plate detector. It is found that in addition to a standard Zr filter, a Mo filter has good rejection characteristics. In particular, for multilayer mirror use at a large angle of incidence such as the polarizing angles around 45°, Mo shows better rejection characteristics than Zr. It is also confirmed that Be transmits non-ignorable amount of UV background.

Original language	English
Pages (from-to)	1075-1077
Number of pages	3
Journal	Journal of Electron Spectroscopy and Related Phenomena
Volume	144-147
DOIs	https://doi.org/10.1016/j.elspec.2005.01.042
Publication status	Published - 2005 Jun

Keywords

EUV
Imaging plate
Laser produced plasma
Thin film filter

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Radiation
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Spectroscopy
Physical and Theoretical Chemistry

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10.1016/j.elspec.2005.01.042

Cite this

@article{092b52a3fd2240c197d17f2df60f6d28,

title = "Thin film filters for an EUV multilayer mirror optics with a laser produced plasma light source",

abstract = "For rejection of unwanted background component in the reflection spectrum of EUV multilayer mirrors, thin film transmission filters of Mo, Zr, and Be were evaluated with a laser produced plasma EUV source and an imaging plate detector. It is found that in addition to a standard Zr filter, a Mo filter has good rejection characteristics. In particular, for multilayer mirror use at a large angle of incidence such as the polarizing angles around 45°, Mo shows better rejection characteristics than Zr. It is also confirmed that Be transmits non-ignorable amount of UV background.",

keywords = "EUV, Imaging plate, Laser produced plasma, Thin film filter",

author = "Tetsuo Harada and Tadashi Hatano",

note = "Funding Information: This research was partially supported by Grant-in-Aid for Specially Promoted Research, No. 15002001 from the Ministry of Education, Culture, Sports, Science and Technology, Japan. The spectral reflectances of the Mo/Si multilayer mirror were measured at the Photon Factory with the approval of the Photon Factory Program Advisory Committee (Proposal No. 2003G180). The authors express their sincere thanks to Prof. M. Yamamoto for his guidance and critically reading the manuscript.",

year = "2005",

month = jun,

doi = "10.1016/j.elspec.2005.01.042",

language = "English",

volume = "144-147",

pages = "1075--1077",

journal = "Journal of Electron Spectroscopy and Related Phenomena",

issn = "0368-2048",

publisher = "Elsevier",

}

TY - JOUR

T1 - Thin film filters for an EUV multilayer mirror optics with a laser produced plasma light source

AU - Harada, Tetsuo

AU - Hatano, Tadashi

N1 - Funding Information: This research was partially supported by Grant-in-Aid for Specially Promoted Research, No. 15002001 from the Ministry of Education, Culture, Sports, Science and Technology, Japan. The spectral reflectances of the Mo/Si multilayer mirror were measured at the Photon Factory with the approval of the Photon Factory Program Advisory Committee (Proposal No. 2003G180). The authors express their sincere thanks to Prof. M. Yamamoto for his guidance and critically reading the manuscript.

PY - 2005/6

Y1 - 2005/6

N2 - For rejection of unwanted background component in the reflection spectrum of EUV multilayer mirrors, thin film transmission filters of Mo, Zr, and Be were evaluated with a laser produced plasma EUV source and an imaging plate detector. It is found that in addition to a standard Zr filter, a Mo filter has good rejection characteristics. In particular, for multilayer mirror use at a large angle of incidence such as the polarizing angles around 45°, Mo shows better rejection characteristics than Zr. It is also confirmed that Be transmits non-ignorable amount of UV background.

AB - For rejection of unwanted background component in the reflection spectrum of EUV multilayer mirrors, thin film transmission filters of Mo, Zr, and Be were evaluated with a laser produced plasma EUV source and an imaging plate detector. It is found that in addition to a standard Zr filter, a Mo filter has good rejection characteristics. In particular, for multilayer mirror use at a large angle of incidence such as the polarizing angles around 45°, Mo shows better rejection characteristics than Zr. It is also confirmed that Be transmits non-ignorable amount of UV background.

KW - EUV

KW - Imaging plate

KW - Laser produced plasma

KW - Thin film filter

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U2 - 10.1016/j.elspec.2005.01.042

DO - 10.1016/j.elspec.2005.01.042

M3 - Article

AN - SCOPUS:17444428117

VL - 144-147

SP - 1075

EP - 1077

JO - Journal of Electron Spectroscopy and Related Phenomena

JF - Journal of Electron Spectroscopy and Related Phenomena

SN - 0368-2048

ER -

Thin film filters for an EUV multilayer mirror optics with a laser produced plasma light source

Abstract

Keywords

ASJC Scopus subject areas

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