Abstract
We report the first multiple angle of incidence ellipsometry in the Extreme Ultra-Violet region. Extreme sensitivity to sub-atomic size of the relative amplitude attenuation of a thin film sample is evident. A large variation of the states of polarization was observed as the angle of incidence was varied. Best fit analysis with a model of a single layer with rough boundaries shows that EUV ellipsometry is sensitive enough to resolve the refractive index of 0.001 and the thickness of 0.1nm.
Original language | English |
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Pages (from-to) | 465-468 |
Number of pages | 4 |
Journal | Journal of Electron Spectroscopy and Related Phenomena |
Volume | 80 |
DOIs | |
Publication status | Published - 1996 May |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Radiation
- Atomic and Molecular Physics, and Optics
- Condensed Matter Physics
- Spectroscopy
- Physical and Theoretical Chemistry