Thin film ellipsometry at a photon energy of 97eV

M. Yamamoto, K. Mayama, H. Kimura, Y. Goto, M. Yanagihara

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)

Abstract

We report the first multiple angle of incidence ellipsometry in the Extreme Ultra-Violet region. Extreme sensitivity to sub-atomic size of the relative amplitude attenuation of a thin film sample is evident. A large variation of the states of polarization was observed as the angle of incidence was varied. Best fit analysis with a model of a single layer with rough boundaries shows that EUV ellipsometry is sensitive enough to resolve the refractive index of 0.001 and the thickness of 0.1nm.

Original languageEnglish
Pages (from-to)465-468
Number of pages4
JournalJournal of Electron Spectroscopy and Related Phenomena
Volume80
DOIs
Publication statusPublished - 1996 May

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Radiation
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Spectroscopy
  • Physical and Theoretical Chemistry

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