Thin-film deposition of silicon-incorporated diamond-like carbon by plasma-enhanced chemical vapor deposition using monomethylsilane as a silicon source

Engineering & Materials Science

• Plasma enhanced chemical vapor deposition 85%
• Diamonds 59%
• Thin films 56%
• Silicon 47%
• Diamond like carbon films 47%
• Carbon 45%
• Residual stresses 26%
• Ion bombardment 24%
• Flow rate 22%
• Deposition rates 19%
• Argon 16%
• Structural properties 16%
• Compressive stress 15%
• Methane 14%
• Relaxation 13%
• Mechanical properties 9%

Physics & Astronomy

• multimission modular spacecraft 100%
• diamonds 47%
• vapor deposition 46%
• carbon 40%
• silicon 32%
• thin films 30%
• residual stress 12%
• flow velocity 10%
• bombardment 6%
• methane 6%
• radio frequencies 5%
• argon 5%