Thin-film deposition of silicon-incorporated diamond-like carbon by plasma-enhanced chemical vapor deposition using monomethylsilane as a silicon source

Hideki Nakazawa, Yuhki Asai, Takeshi Kinoshita, Maki Suemitsu, Toshimi Abe, Kanji Yasui, Takashi Itoh, Tetsuo Endoh, Yuzuru Narita, Atsushi Konno, Yoshiharu Enta, Masao Mashita

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Engineering & Materials Science

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