Abstract
A thickness distribution function is used to describe the non-uniformity of thickness in thin films. A method to determine the thickness distribution function is proposed and applied to r.f. diode-sputtered ultrathin films of platinum deposited onto liquid-nitrogen-cooled quartz substrates. The thickness distribution thus determined can be understood in terms of the completely random deposition of platinum particles of 10 Å thickness. The inelastic mean free path of electrons in platinum is determined to be 9.0 Å for an electron energy of nearly 1168 eV.
Original language | English |
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Pages (from-to) | 47-58 |
Number of pages | 12 |
Journal | Thin Solid Films |
Volume | 46 |
Issue number | 1 |
DOIs | |
Publication status | Published - 1977 Oct 3 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Metals and Alloys
- Materials Chemistry