Thickness distribution in thin films

Takeo Hattori

doi:10.1016/0040-6090(77)90339-X

Thickness distribution in thin films

Takeo Hattori

Research output: Contribution to journal › Article › peer-review

6 Citations (Scopus)

Abstract

A thickness distribution function is used to describe the non-uniformity of thickness in thin films. A method to determine the thickness distribution function is proposed and applied to r.f. diode-sputtered ultrathin films of platinum deposited onto liquid-nitrogen-cooled quartz substrates. The thickness distribution thus determined can be understood in terms of the completely random deposition of platinum particles of 10 Å thickness. The inelastic mean free path of electrons in platinum is determined to be 9.0 Å for an electron energy of nearly 1168 eV.

Original language	English
Pages (from-to)	47-58
Number of pages	12
Journal	Thin Solid Films
Volume	46
Issue number	1
DOIs	https://doi.org/10.1016/0040-6090(77)90339-X
Publication status	Published - 1977 Oct 3

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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10.1016/0040-6090(77)90339-X

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abstract = "A thickness distribution function is used to describe the non-uniformity of thickness in thin films. A method to determine the thickness distribution function is proposed and applied to r.f. diode-sputtered ultrathin films of platinum deposited onto liquid-nitrogen-cooled quartz substrates. The thickness distribution thus determined can be understood in terms of the completely random deposition of platinum particles of 10 {\AA} thickness. The inelastic mean free path of electrons in platinum is determined to be 9.0 {\AA} for an electron energy of nearly 1168 eV.",

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AB - A thickness distribution function is used to describe the non-uniformity of thickness in thin films. A method to determine the thickness distribution function is proposed and applied to r.f. diode-sputtered ultrathin films of platinum deposited onto liquid-nitrogen-cooled quartz substrates. The thickness distribution thus determined can be understood in terms of the completely random deposition of platinum particles of 10 Å thickness. The inelastic mean free path of electrons in platinum is determined to be 9.0 Å for an electron energy of nearly 1168 eV.

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Thickness distribution in thin films

Abstract

ASJC Scopus subject areas

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