Abstract
A thickness distribution function is used to describe the non-uniformity of thickness in thin films. A method to determine the thickness distribution function is proposed and applied to r.f. diode-sputtered ultrathin films of platinum deposited onto liquid-nitrogen-cooled quartz substrates. The thickness distribution thus determined can be understood in terms of the completely random deposition of platinum particles of 10 Å thickness. The inelastic mean free path of electrons in platinum is determined to be 9.0 Å for an electron energy of nearly 1168 eV.
| Original language | English |
|---|---|
| Pages (from-to) | 47-58 |
| Number of pages | 12 |
| Journal | Thin Solid Films |
| Volume | 46 |
| Issue number | 1 |
| DOIs | |
| Publication status | Published - 1977 Oct 3 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Metals and Alloys
- Materials Chemistry
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Hattori, T. (1977). Thickness distribution in thin films. Thin Solid Films, 46(1), 47-58. https://doi.org/10.1016/0040-6090(77)90339-X