Thickness distribution in thin films

Takeo Hattori

    Research output: Contribution to journalArticle

    6 Citations (Scopus)

    Abstract

    A thickness distribution function is used to describe the non-uniformity of thickness in thin films. A method to determine the thickness distribution function is proposed and applied to r.f. diode-sputtered ultrathin films of platinum deposited onto liquid-nitrogen-cooled quartz substrates. The thickness distribution thus determined can be understood in terms of the completely random deposition of platinum particles of 10 Å thickness. The inelastic mean free path of electrons in platinum is determined to be 9.0 Å for an electron energy of nearly 1168 eV.

    Original languageEnglish
    Pages (from-to)47-58
    Number of pages12
    JournalThin Solid Films
    Volume46
    Issue number1
    DOIs
    Publication statusPublished - 1977 Oct 3

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials
    • Surfaces and Interfaces
    • Surfaces, Coatings and Films
    • Metals and Alloys
    • Materials Chemistry

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