Thickness-dependent electronic structure of ultrathin SrRu O3 films studied by in situ photoemission spectroscopy

D. Toyota, I. Ohkubo, H. Kumigashira, M. Oshima, T. Ohnishi, M. Lippmaa, M. Takizawa, A. Fujimori, K. Ono, M. Kawasaki, H. Koinuma

Research output: Contribution to journalArticle

97 Citations (Scopus)

Abstract

In situ thickness-dependent photoemission spectroscopy (PES) has been performed on SrRu O3 (SRO) layers deposited on SrTi O3 substrates to study the structure-induced evolution of the electronic structure. The PES spectra showing the existence of two critical film thicknesses reveal that a metal-insulator transition occurs at a film thickness of 4-5 monolayers (ML) and the evolution of Ru 4d -derived states around the Fermi level (EF) saturates at about 15 ML. The observed spectral behavior well matches the electric and magnetic properties and thickness-dependent evolution of surface morphology of the ultrathin SRO films. These experimental results suggest the importance of the disorder associated with the unique growth-mode transition in SRO films.

Original languageEnglish
Article number162508
Pages (from-to)1-3
Number of pages3
JournalApplied Physics Letters
Volume87
Issue number16
DOIs
Publication statusPublished - 2005 Oct 17
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Fingerprint Dive into the research topics of 'Thickness-dependent electronic structure of ultrathin SrRu O<sub>3</sub> films studied by in situ photoemission spectroscopy'. Together they form a unique fingerprint.

  • Cite this

    Toyota, D., Ohkubo, I., Kumigashira, H., Oshima, M., Ohnishi, T., Lippmaa, M., Takizawa, M., Fujimori, A., Ono, K., Kawasaki, M., & Koinuma, H. (2005). Thickness-dependent electronic structure of ultrathin SrRu O3 films studied by in situ photoemission spectroscopy. Applied Physics Letters, 87(16), 1-3. [162508]. https://doi.org/10.1063/1.2108123