Abstract
The thickness dependence of induced anisotropy in NiFe films in the thickness range from 3 nm to 200 nm was studied. It was established that an annealing time of 6 hours is long enough to saturate the magnitude of the anisotropy field (Hk) at 250°C. The value of Hk decreased as the film thickness decreased.
Original language | English |
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Pages (from-to) | AR-01 |
Journal | Digests of the Intermag Conference |
Publication status | Published - 2000 Jan 1 |
Event | 2000 IEEE International Magnetics Conference-2000 IEEE INTERMAG - Toronto, Ont, Can Duration: 2000 Apr 9 → 2000 Apr 13 |
ASJC Scopus subject areas
- Electrical and Electronic Engineering