The thickness dependence of induced anisotropy in NiFe films in the thickness range from 3 nm to 200 nm was studied. It was established that an annealing time of 6 hours is long enough to saturate the magnitude of the anisotropy field (Hk) at 250°C. The value of Hk decreased as the film thickness decreased.
|Journal||Digests of the Intermag Conference|
|Publication status||Published - 2000 Jan 1|
|Event||2000 IEEE International Magnetics Conference-2000 IEEE INTERMAG - Toronto, Ont, Can|
Duration: 2000 Apr 9 → 2000 Apr 13
ASJC Scopus subject areas
- Electrical and Electronic Engineering