Thickness dependence of induced magnetic anisotropy in very thin permalloy films

H. Katada; T. Shimatsu; I. Watanabe; H. Muraoka; Y. Sugita; Y. Nakamura

Thickness dependence of induced magnetic anisotropy in very thin permalloy films

H. Katada, T. Shimatsu, I. Watanabe, H. Muraoka, Y. Sugita, Y. Nakamura

Research output: Contribution to journal › Conference article › peer-review

Abstract

The thickness dependence of induced anisotropy in NiFe films in the thickness range from 3 nm to 200 nm was studied. It was established that an annealing time of 6 hours is long enough to saturate the magnitude of the anisotropy field (H_k) at 250°C. The value of H_k decreased as the film thickness decreased.

Original language	English
Pages (from-to)	AR-01
Journal	Digests of the Intermag Conference
Publication status	Published - 2000 Jan 1
Event	2000 IEEE International Magnetics Conference-2000 IEEE INTERMAG - Toronto, Ont, Can Duration: 2000 Apr 9 → 2000 Apr 13

ASJC Scopus subject areas

Electrical and Electronic Engineering

Cite this

@article{d6a2747348e248b6b13ded23c6cec86b,

title = "Thickness dependence of induced magnetic anisotropy in very thin permalloy films",

abstract = "The thickness dependence of induced anisotropy in NiFe films in the thickness range from 3 nm to 200 nm was studied. It was established that an annealing time of 6 hours is long enough to saturate the magnitude of the anisotropy field (Hk) at 250°C. The value of Hk decreased as the film thickness decreased.",

author = "H. Katada and T. Shimatsu and I. Watanabe and H. Muraoka and Y. Sugita and Y. Nakamura",

year = "2000",

month = jan,

day = "1",

language = "English",

pages = "AR--01",

journal = "Digests of the Intermag Conference",

issn = "0074-6843",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

note = "2000 IEEE International Magnetics Conference-2000 IEEE INTERMAG ; Conference date: 09-04-2000 Through 13-04-2000",

}

TY - JOUR

T1 - Thickness dependence of induced magnetic anisotropy in very thin permalloy films

AU - Katada, H.

AU - Shimatsu, T.

AU - Watanabe, I.

AU - Muraoka, H.

AU - Sugita, Y.

AU - Nakamura, Y.

PY - 2000/1/1

Y1 - 2000/1/1

N2 - The thickness dependence of induced anisotropy in NiFe films in the thickness range from 3 nm to 200 nm was studied. It was established that an annealing time of 6 hours is long enough to saturate the magnitude of the anisotropy field (Hk) at 250°C. The value of Hk decreased as the film thickness decreased.

AB - The thickness dependence of induced anisotropy in NiFe films in the thickness range from 3 nm to 200 nm was studied. It was established that an annealing time of 6 hours is long enough to saturate the magnitude of the anisotropy field (Hk) at 250°C. The value of Hk decreased as the film thickness decreased.

UR - http://www.scopus.com/inward/record.url?scp=0033696052&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0033696052&partnerID=8YFLogxK

M3 - Conference article

AN - SCOPUS:0033696052

SP - AR-01

JO - Digests of the Intermag Conference

JF - Digests of the Intermag Conference

SN - 0074-6843

T2 - 2000 IEEE International Magnetics Conference-2000 IEEE INTERMAG

Y2 - 9 April 2000 through 13 April 2000

ER -

Thickness dependence of induced magnetic anisotropy in very thin permalloy films

Abstract

ASJC Scopus subject areas

Other files and links

Fingerprint

Cite this