Thickness dependence of induced magnetic anisotropy in very thin permalloy films

H. Katada, T. Shimatsu, I. Watanabe, H. Muraoka, Y. Sugita, Y. Nakamura

Research output: Contribution to journalConference articlepeer-review

Abstract

The thickness dependence of induced anisotropy in NiFe films in the thickness range from 3 nm to 200 nm was studied. It was established that an annealing time of 6 hours is long enough to saturate the magnitude of the anisotropy field (Hk) at 250°C. The value of Hk decreased as the film thickness decreased.

Original languageEnglish
Pages (from-to)AR-01
JournalDigests of the Intermag Conference
Publication statusPublished - 2000 Jan 1
Event2000 IEEE International Magnetics Conference-2000 IEEE INTERMAG - Toronto, Ont, Can
Duration: 2000 Apr 92000 Apr 13

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

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