Thermodynamic analysis for the chemical vapour deposition of non-stoichiometric titanium carbides

Takashl Goto; Chorn Cherng Jiang; Toshio Hirai

doi:10.1016/0022-5088(90)90151-9

Thermodynamic analysis for the chemical vapour deposition of non-stoichiometric titanium carbides

Takashl Goto, Chorn Cherng Jiang, Toshio Hirai

Materials Processing and Characterization Division

Research output: Contribution to journal › Article › peer-review

7 Citations (Scopus)

Abstract

Non-stoichiometric titanium carbide (TiC_x) plates were prepared by the chemical vapour deposition of TiCl₄CCl₄H₂ system. The relationship between deposition conditions and the composition ratio x was established experimentally and examined through thermodynamic calculations. The composition ratio x decreased with increasing deposition temperature and source gas ratio [ CCl₄] [TiCl₄ + CC1₄], agreeing well with the thermodynamic predictions. The experimentally obtained values of x were slightly smaller than the calculated values. This difference was explained by a kinetic reason.

Original language	English
Pages (from-to)	231-236
Number of pages	6
Journal	Journal of the Less-Common Metals
Volume	159
Issue number	C
DOIs	https://doi.org/10.1016/0022-5088(90)90151-9
Publication status	Published - 1990 Apr 1

ASJC Scopus subject areas

Engineering(all)

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title = "Thermodynamic analysis for the chemical vapour deposition of non-stoichiometric titanium carbides",

abstract = "Non-stoichiometric titanium carbide (TiCx) plates were prepared by the chemical vapour deposition of TiCl4CCl4H2 system. The relationship between deposition conditions and the composition ratio x was established experimentally and examined through thermodynamic calculations. The composition ratio x decreased with increasing deposition temperature and source gas ratio [ CCl4] [TiCl4 + CC14], agreeing well with the thermodynamic predictions. The experimentally obtained values of x were slightly smaller than the calculated values. This difference was explained by a kinetic reason.",

author = "Takashl Goto and Jiang, {Chorn Cherng} and Toshio Hirai",

note = "Funding Information: This researchw as supportedi n part by a Grant-in-Aid for ScientificR esearch under Contract 63603505 from the Ministry of Education, Sciencea nd Culture, Japan.",

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doi = "10.1016/0022-5088(90)90151-9",

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T1 - Thermodynamic analysis for the chemical vapour deposition of non-stoichiometric titanium carbides

AU - Goto, Takashl

AU - Jiang, Chorn Cherng

AU - Hirai, Toshio

N1 - Funding Information: This researchw as supportedi n part by a Grant-in-Aid for ScientificR esearch under Contract 63603505 from the Ministry of Education, Sciencea nd Culture, Japan.

PY - 1990/4/1

Y1 - 1990/4/1

N2 - Non-stoichiometric titanium carbide (TiCx) plates were prepared by the chemical vapour deposition of TiCl4CCl4H2 system. The relationship between deposition conditions and the composition ratio x was established experimentally and examined through thermodynamic calculations. The composition ratio x decreased with increasing deposition temperature and source gas ratio [ CCl4] [TiCl4 + CC14], agreeing well with the thermodynamic predictions. The experimentally obtained values of x were slightly smaller than the calculated values. This difference was explained by a kinetic reason.

AB - Non-stoichiometric titanium carbide (TiCx) plates were prepared by the chemical vapour deposition of TiCl4CCl4H2 system. The relationship between deposition conditions and the composition ratio x was established experimentally and examined through thermodynamic calculations. The composition ratio x decreased with increasing deposition temperature and source gas ratio [ CCl4] [TiCl4 + CC14], agreeing well with the thermodynamic predictions. The experimentally obtained values of x were slightly smaller than the calculated values. This difference was explained by a kinetic reason.

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JO - Journal of Alloys and Compounds

JF - Journal of Alloys and Compounds

SN - 0925-8388

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Thermodynamic analysis for the chemical vapour deposition of non-stoichiometric titanium carbides

Abstract

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