Thermodynamic analysis for the chemical vapour deposition of non-stoichiometric titanium carbides

Takashl Goto, Chorn Cherng Jiang, Toshio Hirai

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)

Abstract

Non-stoichiometric titanium carbide (TiCx) plates were prepared by the chemical vapour deposition of TiCl4CCl4H2 system. The relationship between deposition conditions and the composition ratio x was established experimentally and examined through thermodynamic calculations. The composition ratio x decreased with increasing deposition temperature and source gas ratio [ CCl4] [TiCl4 + CC14], agreeing well with the thermodynamic predictions. The experimentally obtained values of x were slightly smaller than the calculated values. This difference was explained by a kinetic reason.

Original languageEnglish
Pages (from-to)231-236
Number of pages6
JournalJournal of the Less-Common Metals
Volume159
Issue numberC
DOIs
Publication statusPublished - 1990 Apr 1

ASJC Scopus subject areas

  • Engineering(all)

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