Thermally poled silicate thin films with large second-harmonic generation

Okihiro Sugihara, M. Nakanishi, H. Fujimura, C. Egami, N. Okamoto

Research output: Contribution to journalArticlepeer-review

10 Citations (Scopus)

Abstract

Ge- and Ti-doped silica thin films were prepared upon various substrates by solgel processing and rf sputtering. Large second-harmonic generation was measured from thermally poled thin-film samples. The origin of nonlinearity and its distribution from thermally poled silicate thin films were investigated. Moreover, we measured the stability of the nonlinearity of a rf-sputtered germanosilicate thin film upon a silica glass substrate against heat and intense laser light sufficient for the fabrication of waveguide-type nonlinear optical devices.

Original languageEnglish
Pages (from-to)421-425
Number of pages5
JournalJournal of the Optical Society of America B: Optical Physics
Volume15
Issue number1
DOIs
Publication statusPublished - 1998 Jan 1

ASJC Scopus subject areas

  • Statistical and Nonlinear Physics
  • Atomic and Molecular Physics, and Optics

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