Thermal stability of sputtered mo/x and w/x (X = bn:O, b4c:O, si, and c) multilayer soft-x-ray mirrors

Hisayuki Okada, Kou Mayama, Yoshinori Goto, Isao Kusunoki, Mihiro Yanagihara

Research output: Contribution to journalArticlepeer-review

21 Citations (Scopus)

Abstract

We prepared eight samples of Mo/X and W/X (X = BN:O, B4C:O, Si, and C) multilayers by magnetron sputtering. Analyses of x-ray photoelectron spectroscopy for the boron nitride and the B4C layers showed the concentration of 0 to be nonnegligible. We have evaluated the thermal stability by measuring soft-x-ray specular reflectances before and after thermal annealing occurs at temperatures as high as 700 'C. The results suggest that the thermal stability depends largely on the inclusion of low-density materials and not on the type of metal. Of the four low-density materials studied, BN:O is thermally the most stable, and the Mo/BN:O multilayer, the most stable among the eight samples, shows stability as high as 700 C.

Original languageEnglish
Pages (from-to)4219-4224
Number of pages6
JournalApplied optics
Volume33
Issue number19
DOIs
Publication statusPublished - 1994 Jul

Keywords

  • Annealing test
  • Boron nitride
  • Multilayer mirror
  • Reflectance
  • Soft x ray

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Engineering (miscellaneous)
  • Electrical and Electronic Engineering

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