Thermal stability of sputtered mo/x and w/x (X = bn:O, b4c:O, si, and c) multilayer soft-x-ray mirrors

Hisayuki Okada; Kou Mayama; Yoshinori Goto; Isao Kusunoki; Mihiro Yanagihara

doi:10.1364/AO.33.004219

Thermal stability of sputtered mo/x and w/x (X = bn:O, b4c:O, si, and c) multilayer soft-x-ray mirrors

Hisayuki Okada, Kou Mayama, Yoshinori Goto, Isao Kusunoki, Mihiro Yanagihara

Research output: Contribution to journal › Article › peer-review

23 Citations (Scopus)

Abstract

We prepared eight samples of Mo/X and W/X (X = BN:O, B4C:O, Si, and C) multilayers by magnetron sputtering. Analyses of x-ray photoelectron spectroscopy for the boron nitride and the B4C layers showed the concentration of 0 to be nonnegligible. We have evaluated the thermal stability by measuring soft-x-ray specular reflectances before and after thermal annealing occurs at temperatures as high as 700 'C. The results suggest that the thermal stability depends largely on the inclusion of low-density materials and not on the type of metal. Of the four low-density materials studied, BN:O is thermally the most stable, and the Mo/BN:O multilayer, the most stable among the eight samples, shows stability as high as 700 C.

Original language	English
Pages (from-to)	4219-4224
Number of pages	6
Journal	Applied optics
Volume	33
Issue number	19
DOIs	https://doi.org/10.1364/AO.33.004219
Publication status	Published - 1994 Jul
Externally published	Yes

Keywords

Annealing test
Boron nitride
Multilayer mirror
Reflectance
Soft x ray

ASJC Scopus subject areas

Atomic and Molecular Physics, and Optics
Engineering (miscellaneous)
Electrical and Electronic Engineering

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10.1364/AO.33.004219

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title = "Thermal stability of sputtered mo/x and w/x (X = bn:O, b4c:O, si, and c) multilayer soft-x-ray mirrors",

abstract = "We prepared eight samples of Mo/X and W/X (X = BN:O, B4C:O, Si, and C) multilayers by magnetron sputtering. Analyses of x-ray photoelectron spectroscopy for the boron nitride and the B4C layers showed the concentration of 0 to be nonnegligible. We have evaluated the thermal stability by measuring soft-x-ray specular reflectances before and after thermal annealing occurs at temperatures as high as 700 'C. The results suggest that the thermal stability depends largely on the inclusion of low-density materials and not on the type of metal. Of the four low-density materials studied, BN:O is thermally the most stable, and the Mo/BN:O multilayer, the most stable among the eight samples, shows stability as high as 700 C.",

keywords = "Annealing test, Boron nitride, Multilayer mirror, Reflectance, Soft x ray",

author = "Hisayuki Okada and Kou Mayama and Yoshinori Goto and Isao Kusunoki and Mihiro Yanagihara",

year = "1994",

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doi = "10.1364/AO.33.004219",

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T1 - Thermal stability of sputtered mo/x and w/x (X = bn:O, b4c:O, si, and c) multilayer soft-x-ray mirrors

AU - Okada, Hisayuki

AU - Mayama, Kou

AU - Goto, Yoshinori

AU - Kusunoki, Isao

AU - Yanagihara, Mihiro

PY - 1994/7

Y1 - 1994/7

N2 - We prepared eight samples of Mo/X and W/X (X = BN:O, B4C:O, Si, and C) multilayers by magnetron sputtering. Analyses of x-ray photoelectron spectroscopy for the boron nitride and the B4C layers showed the concentration of 0 to be nonnegligible. We have evaluated the thermal stability by measuring soft-x-ray specular reflectances before and after thermal annealing occurs at temperatures as high as 700 'C. The results suggest that the thermal stability depends largely on the inclusion of low-density materials and not on the type of metal. Of the four low-density materials studied, BN:O is thermally the most stable, and the Mo/BN:O multilayer, the most stable among the eight samples, shows stability as high as 700 C.

AB - We prepared eight samples of Mo/X and W/X (X = BN:O, B4C:O, Si, and C) multilayers by magnetron sputtering. Analyses of x-ray photoelectron spectroscopy for the boron nitride and the B4C layers showed the concentration of 0 to be nonnegligible. We have evaluated the thermal stability by measuring soft-x-ray specular reflectances before and after thermal annealing occurs at temperatures as high as 700 'C. The results suggest that the thermal stability depends largely on the inclusion of low-density materials and not on the type of metal. Of the four low-density materials studied, BN:O is thermally the most stable, and the Mo/BN:O multilayer, the most stable among the eight samples, shows stability as high as 700 C.

KW - Annealing test

KW - Boron nitride

KW - Multilayer mirror

KW - Reflectance

KW - Soft x ray

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Thermal stability of sputtered mo/x and w/x (X = bn:O, b4c:O, si, and c) multilayer soft-x-ray mirrors

Abstract

Keywords

ASJC Scopus subject areas

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