Thermal behavior of hydrogen retained in amorphous-titanium-hydride thin films

B. Tsuchiya, T. Ishigami, S. Nagata, T. Shikama

Research output: Contribution to journalConference articlepeer-review

4 Citations (Scopus)

Abstract

Changes in hydrogen distribution near the surface of non-stoichiometric titanium hydride (TiHx; x=0.49) thin films possessing an amorphous structure and approximately 170 and 400 nm thick, prepared by a magnetron ion-sputtering device, were investigated by combining an elastic recoil detection (ERD) technique with Rutherford backscattering spectrometry (RBS) one after isochronal annealing at different temperatures (300-500 K) for 10 min. The concentration of hydrogen atoms retained in TiHx thin films completely vanished at much lower temperatures of 350-400 K, as compared with the decomposition temperature (approximately 473 K) of δ-phase titanium hydride (δ-TiH1.92). In addition, the thickness of TiHx thin films also reduced with an increase in temperature. The rapid decrease of the hydrogen concentration in TiHx thin films below 400 K is caused by thermal desorption of hydrogen atoms, detrapped from the amorphous structure and associated, in addition, with Ti evaporation.

Original languageEnglish
Article number012027
JournalJournal of Physics: Conference Series
Volume417
Issue number1
DOIs
Publication statusPublished - 2013 Jan 1
Event15th International Conference on Thin Films, ICTF 2011 - Kyoto, Japan
Duration: 2011 Nov 82011 Nov 11

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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