Theoretical investigation of the interfaces between Hf-based high-k dielectrics and poly-Si and metal gates

K. Shiraishi, T. Nakayama, Y. Akasaka, S. Miyazaki, T. Nakaoka, K. Ohmori, P. Ahmet, K. Torii, H. Watanabe, T. Chikyow, Y. Nara, K. Yamada

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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Engineering & Materials Science