The ultra clean sputtering process and high density magnetic recording media

Migaku Takahashi; Akira Kikuchi; Shinya Kawakita

doi:10.1109/20.617804

The ultra clean sputtering process and high density magnetic recording media

Migaku Takahashi, Akira Kikuchi, Shinya Kawakita

Research output: Contribution to journal › Article › peer-review

41 Citations (Scopus)

Abstract

The ultra clean sputtering process (UC-process) was newly introduced in the fabrication of CoNiCr and CoCrTa thin film media to establish the new concept of controlling the microstructure and magnetic properties. The relation between cleanness during film deposition process and magnetic properties has been discussed hi connection with their microstructure. The UC-process here presented enables the control of the fine structure of the thin fllm media and resulted in excellent magnetic properties. This study demonstrates that the UC-process is very superior to the normal process presently used and plays a dominant role for the thin film media fabrication.

Original language	English
Pages (from-to)	2938-2943
Number of pages	6
Journal	IEEE Transactions on Magnetics
Volume	33
Issue number	5 PART 1
DOIs	https://doi.org/10.1109/20.617804
Publication status	Published - 1997 Dec 1

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Electrical and Electronic Engineering

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