The ultra clean sputtering process and high density magnetic recording media

Migaku Takahashi, Akira Kikuchi, Shinya Kawakita

    Research output: Contribution to journalArticlepeer-review

    41 Citations (Scopus)

    Abstract

    The ultra clean sputtering process (UC-process) was newly introduced in the fabrication of CoNiCr and CoCrTa thin film media to establish the new concept of controlling the microstructure and magnetic properties. The relation between cleanness during film deposition process and magnetic properties has been discussed hi connection with their microstructure. The UC-process here presented enables the control of the fine structure of the thin fllm media and resulted in excellent magnetic properties. This study demonstrates that the UC-process is very superior to the normal process presently used and plays a dominant role for the thin film media fabrication.

    Original languageEnglish
    Pages (from-to)2938-2943
    Number of pages6
    JournalIEEE Transactions on Magnetics
    Volume33
    Issue number5 PART 1
    DOIs
    Publication statusPublished - 1997 Dec 1

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials
    • Electrical and Electronic Engineering

    Fingerprint Dive into the research topics of 'The ultra clean sputtering process and high density magnetic recording media'. Together they form a unique fingerprint.

    Cite this