The structure and tribological property of amorphous carbon and carbon nitride films prepared by ECR plasma sputtering method

T. Ohana, A. Goto, K. Yamamoto, T. Nakamura, A. Tanaka, Y. Osawa, H. Yoda, Masashi Sahashi, Y. Koga

Research output: Contribution to journalArticlepeer-review

22 Citations (Scopus)

Abstract

Amorphous carbon and carbon nitride (CNx) films were deposited by using the ECR plasma sputtering method. The films were deposited on a silicon substrate at room temperature by the sputtering of a carbon target by argon and argon/nitrogen ion plasma. The properties of films were investigated by XPS, Raman, SEM, and tribological measurements. The maximum of nitrogen content was N/C = 0.6 in the film deposited in a nitrogen atmosphere. The friction coefficient of deposited films increased with increasing of nitrogen content. The CSS test of ultra-thin films on an Al/TiC slider with a Si intermediate layer (2 nm) indicates that a 5-nm thickness film of carbon nitride has the most significant toughness for a magnetic head.

Original languageEnglish
Pages (from-to)1093-1097
Number of pages5
JournalDiamond and Related Materials
Volume10
Issue number3-7
DOIs
Publication statusPublished - 2001 Mar 1

Keywords

  • Amorphous carbon
  • Friction
  • Nitride
  • Tribology

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Chemistry(all)
  • Mechanical Engineering
  • Physics and Astronomy(all)
  • Materials Chemistry
  • Electrical and Electronic Engineering

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