Amorphous carbon and carbon nitride (CNx) films were deposited by using the ECR plasma sputtering method. The films were deposited on a silicon substrate at room temperature by the sputtering of a carbon target by argon and argon/nitrogen ion plasma. The properties of films were investigated by XPS, Raman, SEM, and tribological measurements. The maximum of nitrogen content was N/C = 0.6 in the film deposited in a nitrogen atmosphere. The friction coefficient of deposited films increased with increasing of nitrogen content. The CSS test of ultra-thin films on an Al/TiC slider with a Si intermediate layer (2 nm) indicates that a 5-nm thickness film of carbon nitride has the most significant toughness for a magnetic head.
- Amorphous carbon
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Mechanical Engineering
- Physics and Astronomy(all)
- Materials Chemistry
- Electrical and Electronic Engineering