The structural stability of reactively-sputtered amorphous multilayer films

I. Honma, H. Hotta, K. Kawai, H. Komiyama, K. Tanaka

Research output: Contribution to journalArticlepeer-review

18 Citations (Scopus)

Abstract

It is reported for the first time on reactively-sputtered a-Ge:H(a-Ge)/a-GeNx multilayer structures that the structural stability changes systematically depending on the layer thickness and a nature of the layer-layer interface. This effect has been interpreted qualitatively on the basis of the thermodynamical discussion on the free-energy change in two-dimensional crystallization process of a thin-film multilayer structure.

Original languageEnglish
Pages (from-to)947-950
Number of pages4
JournalJournal of Non-Crystalline Solids
Volume97-98
Issue numberPART 2
DOIs
Publication statusPublished - 1987 Dec 2
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Ceramics and Composites
  • Condensed Matter Physics
  • Materials Chemistry

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