The selective area deposition of diamond films

Hongwu Liu, Chunxiao Gao, Guangtian Zou, Xun Li, Chengxin Wang, Chao Wen

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)


By selectively seeding, polycrystalline diamond films have been patterned on mirror-polished Si substrate using hot-filament chemical vapor deposition. Results show high selectivity and high quality in patterned diamond films deposited at 0.05% CH4/H2 concentration and at the growth rate of 2.6 μm/h. The selective area deposition (SAD) method is easy to be applied to a large and a different substrate.

Original languageEnglish
Pages (from-to)1323-1324
Number of pages2
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Issue number3 A
Publication statusPublished - 2000
Externally publishedYes


  • High selectivity
  • Hot-filament chemical vapor deposition
  • Polycrystalline diamond films
  • Selective area deposition
  • Selectively seeding

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)


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