The passivation behavior of sputter-deposited W-Ta alloys in 12M HCl

J. Bhattarai, E. Akiyama, H. Habazaki, A. Kawashima, K. Asami, K. Hashimoto

Research output: Contribution to journalArticlepeer-review

40 Citations (Scopus)

Abstract

A series of nanocrystalline or amorphous single solid solutions of W-Ta alloys are prepared by D.C. magnetron sputtering. The passivation behavior of these alloys is studied by immersion test, electrochemical measurements and X-ray photoelectron spectroscopy (XPS) analyhsis. The W-Ta alloys are passivated sponstaneously and show significantly high corrosion resistance in 12 M HCI at 30°C. Their corrosion rates are about two orders of magnitude lower than that of sputter-deposited tungsten and are lower than that of sputter-deposited tantalum. XPS analysis shows that tantalum is concentrated in both the air-formed films and the passive films formed spontaneously on the alloys after long time immersion in 12 M HCI. The surface films are composed of double oxhydroxides of Ta5+ and W4+ ions. The formation of spontaneous passive film composed of a double oxyhydroxide of tungsten and tantalum ions is responsible for high corrosion resistance of the W-Ta alloys in concentrated hydrochloric acid solution.

Original languageEnglish
Pages (from-to)757-779
Number of pages23
JournalCorrosion Science
Volume40
Issue number4-5
DOIs
Publication statusPublished - 1998 Apr 1

ASJC Scopus subject areas

  • Chemistry(all)
  • Chemical Engineering(all)
  • Materials Science(all)

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