The K+-C60- plasma for material processing

T. Hirata, R. Hatakeyama, T. Mieno, S. Iizuka, N. Sato

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

A new plasma source is developed by introducing 'Buckminsterfullerene', C60, particles into a low-temperature (about 0.2 eV) potassium plasma column confined by a strong axial magnetic field, which consists of electrons, positive K+ ions and large negative C60- ions. Drastic changes in characteristics of thin films formed by using the plasma are observed in accordance with bias control of fluxes and energies of K+ and C60- ions coming into contact with substrates. It is hoped that this ultra-fine-particle plasma will be useful for producing C60-based materials with unique functions such as alkali fullerides, endohedral metallofullerenes and polymers.

Original languageEnglish
Pages (from-to)288-292
Number of pages5
JournalPlasma Sources Science and Technology
Volume5
Issue number2
DOIs
Publication statusPublished - 1996 Dec 1

ASJC Scopus subject areas

  • Condensed Matter Physics

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    Hirata, T., Hatakeyama, R., Mieno, T., Iizuka, S., & Sato, N. (1996). The K+-C60- plasma for material processing. Plasma Sources Science and Technology, 5(2), 288-292. https://doi.org/10.1088/0963-0252/5/2/025