This paper presents a study of track edge writing phenomena with a view to achieving submicron track width longitudinal recording. Side written bands made by 1 µm wide high Bs FeTaN heads were compared with those by conventional NiFe thin film heads with the same width. Off-track overwrite experiments revealed that the balanced condition of the narrowed write gap and strong head fields by high Bs poles suppressed the width of the degraded side written band and excessive erase band forming near the track edges. An analytical write modeling considering the non-saturation side writing process also showed that optimized narrow write gap along with strong head fields improved the write resolution throughout the narrow track.
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering