The effect of MgO barrier on the structure and magnetic properties of Co2 MnSi films on n -Si(100) substrates

M. A.I. Nahid, M. Oogane, H. Naganuma, Y. Ando

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Abstract

We investigated the structure and magnetic properties of Co2 MnSi/MgO/n-Si (100) films with the goal of achieving efficient spin injection. The Co2 MnSi films were fabricated by dc sputtering and post annealed at 400 °C for 1 h. They were oriented along the 〈 100 〉 direction with a MgO barrier layer. A strong chemical reaction was observed between the Co2 MnSi thin films and n -Si substrates in the absence of the MgO barrier. The diffusion or chemical reaction may occur up to a MgO layer thickness of 2 nm. With a MgO layer that is 2 nm thick, Co2 MnSi possessed large saturation magnetization and low surface roughness at room temperature. The electrical (I-V) characteristics of Co2 MnSi/MgO (2 nm) /n-Si (100) obtained at various junction sizes were symmetric, suggesting that MgO was an effective tunnel barrier.

Original languageEnglish
Article number103907
JournalJournal of Applied Physics
Volume106
Issue number10
DOIs
Publication statusPublished - 2009 Dec 16

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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