The effect of doping concentration of Si on the nature of barrier of Co2MnSi/MgO/n-Si junctions

Research output: Contribution to journalArticle

Abstract

In this work, we have presented the electrical characteristic of Co 2MnSi/MgO/n-Si junctions as a function of the doping concentration of Si. Films were fabricated by dc sputtering and post annealed at 400°C for 1 h without breaking the vacuum. The Co2MnSi/MgO/n-Si -Sijunctions exhibited diode like characteristics at low doping concentration 10 16/cc. This can be attributed due to oxide charges or interface traps close to the silicon interface, which causes the bend bending and forms the large extended depletion region. The junction characteristic was found to change with the increase of doping concentration and became symmetric at doping concentration of 1019/cc. Therefore, with the same thickness of MgO barrier, the junction characteristic was changed from Schottky to symmetric tunneling with the doping density of Si. The origin of the change of junction characteristic might be due to the change of the depletion width with the doping density.

Original languageEnglish
Article number5467513
Pages (from-to)1637-1640
Number of pages4
JournalIEEE Transactions on Magnetics
Volume46
Issue number6
DOIs
Publication statusPublished - 2010 Jun 1

Keywords

  • Doping concentration
  • Interface traps
  • Oxide charges
  • Schottky
  • Spin injection

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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