The corrosion behaviour of sputter-deposited amorphous NiTi alloys in 1 M HCl

Eiji Akiyama, Hiroki Habazaki, Asahi Kawashima, Katsuhiko Asami, Koji Hashimoto

Research output: Contribution to journalArticlepeer-review

24 Citations (Scopus)

Abstract

Amorphous NiTi alloys were prepared by d.c. magnetron sputtering. The corrosion behaviour of amorphous NiTi alloys in 1 M HCl was investigated by electrochemical measurements. Particular attention was paid to the compositions of the surface film and underlying alloy surface just below the surface film. The amorphous NiTi alloys were spontaneously passive. An X-ray photoelectron spectroscopy analysis revealed that the thickness of the surface film was increased linearly with an increase in the polarization potential. The growth rates for amorphous Ni32Ti and Ni62Ti alloys were the same as each other and slightly lower than the growth rate of sputter-deposited titanium. The passive film formed on the sputter-deposited amorphous NiTi alloys was enriched in titanium cation. In the underlying alloy surface just below the surface film after polarization for 1 h, the titanium content increased linearly with the increase in the potential. At relatively low potentials, nickel was concentrated in the underlying alloy surface, while at relatively high potentials the content of titanium was higher than that in the bulk alloy.

Original languageEnglish
Pages (from-to)1128-1132
Number of pages5
JournalMaterials Science and Engineering A
Volume181-182
Issue numberC
DOIs
Publication statusPublished - 1994 May 15

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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