The correlation between an electric field and the metastable chlorine ion density distributions in an ultrahigh-frequency plasma

Toshiki Nakano, Seiji Samukawa

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)

Abstract

The electric field strength in an ultrahigh-frequency (UHF) plasma, as well as in an inductively coupled plasma (ICP), is measured with an electrostatic probe as a function of the radial and azimuthal positions of the plasma reactor. On comparing the electric field distribution with the radial density profile of metastable chlorine ions measured by Doppler-shifted laser-induced fluorescence, the electric field distribution is determined to be positively correlated to the ionization rate distribution in the UHF plasma, while that in the ICP seems to be less dependent on the electric field distribution. This phenomenon probably arises due to the large difference in the discharge frequency between the UHF plasma and the ICP. No remarkable azimuthal dependence of the radial average velocity and the temperature of the metastable Cl+ is observed, indicating that the two-dimensionally uniform plasma is produced by UHF power through a spokewise antenna.

Original languageEnglish
Pages (from-to)2686-2692
Number of pages7
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume37
Issue number5 A
Publication statusPublished - 1998 Dec 1
Externally publishedYes

Keywords

  • Chlorine
  • Doppler-shifted laser-induced fluorescence
  • Electric field distribution
  • Ion velocity distribution
  • Uhf plasma

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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