The 248 nm excimer laser ablation of liquid benzene derivatives: A relation between ablation threshold and molecular photochemical reactivity

Yasuyuki Tsuboi, Koji Hatanaka, Hiroshi Fukumura, Hiroshi Masuhara

Research output: Contribution to journalArticlepeer-review

72 Citations (Scopus)

Abstract

The 248 nm laser ablation of liquid benzene, chlorobenzene, toluene, benzyl chloride, and benzyl alcohol was investigated by photoacoustic, nanosecond photographic, and time-resolved spectroscopic measurements. Ablation threshold was confirmed to be correlated to photochemical reactivities of molecules, while no distinct relation between the threshold and boiling point of liquids was observed. Emissions from dissociated radicals responsible for the ablation were clearly detected at fluences highly above the threshold. On the basis of these results, it is strongly suggested that a photothermal mechanism dose not have an important role, and ablation is initiated by photochemical fragmentation.

Original languageEnglish
Pages (from-to)11237-11241
Number of pages5
JournalJournal of physical chemistry
Volume98
Issue number44
DOIs
Publication statusPublished - 1994 Jan 1

ASJC Scopus subject areas

  • Engineering(all)
  • Physical and Theoretical Chemistry

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