Texture and orientation characteristics of α-Al2O3 films prepared by laser chemical vapor deposition using Nd:YAG laser

Akihiko Ito, Hokuto Kadokura, Teiichi Kimura, Takashi Goto

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54 Citations (Scopus)


α-Al2O3 films were prepared by laser chemical vapor deposition (LCVD) and the effects of precursor vaporization temperature (Tvap), total chamber pressure (Ptot), laser power (PL) and deposition temperature (Tdep) on the phase, orientation and texture of Al2O3 film were investigated. At Ptot = 0.93 kPa, α-Al2O3 films were obtained in the region of Tvap > 423 K and Tdep > 1100 K. The orientation of α-Al2O3 film changed from (1 1 0) to (0 1 2) to (1 0 4) to (0 0 6) with increasing Ptot. Porous α-Al2O3 films were formed at high Tvap (443 K) and low Ptot (0.47 kPa). At Tvap = 413 K, α-Al2O3 film had hexagonal and rectangular plate-like grains with finely faceted edges. With increasing Ptot = 0.93-1.4 kPa, (0 0 6)-oriented α-Al2O3 film with a hexagonal terrace texture was obtained.

Original languageEnglish
Pages (from-to)469-474
Number of pages6
JournalJournal of Alloys and Compounds
Issue number2
Publication statusPublished - 2010 Jan 21


  • Alumina
  • Coating
  • Laser CVD
  • Microstructure
  • Orientation

ASJC Scopus subject areas

  • Mechanics of Materials
  • Mechanical Engineering
  • Metals and Alloys
  • Materials Chemistry

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