TEM analysis on nanovoid formation in annealed amorphous oxides

Ryusuke Nakamura, Takehiro Shudo, Akihiko Hirata, Manabu Ishimaru, Hideo Nakajima

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Formation behavior of nanovoids during the annealing of amorphous Al 2O3 and WO3 was studied by transmission electron microscopy. The density and size of the voids in Al2O 3 and WO3 increase with increasing annealing temperature from 973 to 1123 K and from 573 to 673 K, respectively. It is suggested that the formation of nanovoids during annealing is attributed to the large difference in density between as-deposited amorphous and crystalline oxides.

Original languageEnglish
Title of host publicationEco-Materials Processing and Design XII
PublisherTrans Tech Publications Ltd
Pages541-544
Number of pages4
ISBN (Print)9783037852224
DOIs
Publication statusPublished - 2011 Jan 1

Publication series

NameMaterials Science Forum
Volume695
ISSN (Print)0255-5476
ISSN (Electronic)1662-9752

Keywords

  • Amorphous oxides
  • Crystallization
  • Nanoporous

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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