Tb-Fe Sputtered Films with Large Magnetostriction for Use in Magnetomechanical Thin-Film Devices

Y. Hayashi, M. Yamaguchi, K. I. Arai, T. Honda

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

We examined the magnetostriction and coercive force of amorphous Tb-Fe films sputter-deposited under different conditions (rf input power, Ar gas pressure, Tb content, etc.). Here we discuss the possibility of obtaining both soft magnetic properties and a large magnetostriction in this system. Soft magnetic properties and large magnetostriction were obtained simultaneously in sputtered Tb-Fe thin films prepared with a Tb content of 45 to 50 at%, under an Ar gas pressure of 4 mTorr and with an rf input power of 200 W. This material has strong potential for use in magnetomechanical thin-film devices.

Original languageEnglish
Pages (from-to)124-128
Number of pages5
JournalIEEE Translation Journal on Magnetics in Japan
Volume9
Issue number1
DOIs
Publication statusPublished - 1994

ASJC Scopus subject areas

  • Engineering (miscellaneous)
  • Engineering(all)

Fingerprint Dive into the research topics of 'Tb-Fe Sputtered Films with Large Magnetostriction for Use in Magnetomechanical Thin-Film Devices'. Together they form a unique fingerprint.

Cite this