Ta2O5-based redox memory formed by neutral beam oxidation

Takeo Ohno, Seiji Samukawa

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)


A room temperature neutral beam oxidation process using a tantalum (Ta) metal film was used to obtain a high quality Ta oxide (Ta2O5) film. After irradiation of a Ta metal film with a neutral oxygen beam, a nanometer-thick Ta2O5 film with a film density of 7.5 g/cm3 was obtained. We also confirmed that the fabricated Cu/Ta2O5/Pt redox memory structure shows a bipolar resistive switching characteristic. This result demonstrates the great potential of neutral beam metal oxidation for the development of redox-based memory devices.

Original languageEnglish
Article number06GJ01
JournalJapanese journal of applied physics
Issue number6
Publication statusPublished - 2016 Jun

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)


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