Pseudobrookite Ti3-δO4N films were prepared by laser chemical vapor deposition with titanium tetraisopropoxide and NH3 as precursors. By increasing the deposition temperature from 964 K to 1294 K, the phase composition of the films changed from TiO2 to Ti3-δO4N and subsequently to Ti(O,N). Ti3-δO4N films with fine columnar grains were obtained at 1030 K and at a total chamber pressure of 0.6-0.8 kPa. The deposition rate of these films reached 7 μm h-1.
- Laser chemical vapor deposition
- Titanium oxynitride
ASJC Scopus subject areas
- Condensed Matter Physics
- Surfaces, Coatings and Films