Synthesis of pseudobrookite titanium oxynitride Ti3-δO4N films by laser chemical vapor deposition

Akihiko Ito, Hye Sook Joo, Taek Soo Kim, Takashi Goto

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)


Pseudobrookite Ti3-δO4N films were prepared by laser chemical vapor deposition with titanium tetraisopropoxide and NH3 as precursors. By increasing the deposition temperature from 964 K to 1294 K, the phase composition of the films changed from TiO2 to Ti3-δO4N and subsequently to Ti(O,N). Ti3-δO4N films with fine columnar grains were obtained at 1030 K and at a total chamber pressure of 0.6-0.8 kPa. The deposition rate of these films reached 7 μm h-1.

Original languageEnglish
Pages (from-to)121-123
Number of pages3
Publication statusPublished - 2015 Jun 1


  • Laser chemical vapor deposition
  • Pseudobrookite
  • TiON
  • Titanium oxynitride

ASJC Scopus subject areas

  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films

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