Synthesis of photo-curable borosilicate thin-film material and fabrication of microstructure

Rie Ihara, Masahide Takahashi

Research output: Contribution to journalArticlepeer-review

Abstract

Photo-curable organoborosilicate glasses were synthesized through a catalyst- and solvent-free and non-aqueous alcohol condensation process at low temperature below 100°C. Formation of Si-O-B linkage was confirmed by IR spectra. After irradiation of UV-light, we have successfully cured the prepolymer coatings into prepared transparent and homogeneous thin film. A refractive index of the thin film of B(OH)3: 3- Methacryloxypropyltrimethoxysilane= 1:1 composition was measured by a prism coupling method M= 1.515 at 633 nm. Moreover, pencil hardnesses according to JIS5400 of photo-cured thin film before and after heat treatment at 550°C were 6H and over 10H, respectively. We demonstrated fabrication of microstructures on transparent thin film by embossing process followed by photo curing.

Original languageEnglish
Pages (from-to)537-541
Number of pages5
JournalFuntai Oyobi Fummatsu Yakin/Journal of the Japan Society of Powder and Powder Metallurgy
Volume57
Issue number7
DOIs
Publication statusPublished - 2010 Jul

Keywords

  • Micro fabrication
  • Organic-inorganic hybrid material
  • Photo-curable borosilicate glass
  • Polymerization

ASJC Scopus subject areas

  • Mechanical Engineering
  • Industrial and Manufacturing Engineering
  • Metals and Alloys
  • Materials Chemistry

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