Synthesis of GaAs nanoparticles by digital radio frequency sputtering

M. Hirasawa, N. Ichikawa, Y. Egashira, I. Honma, H. Komiyama

Research output: Contribution to journalArticlepeer-review

31 Citations (Scopus)


Nanometer-sized GaAs particles embedded in SiO2 were prepared by a digital rf-sputtering method, where GaAs and SiO2 targets were alternately sputtered in an Ar atmosphere. The GaAs deposition time was kept shorter than the time required to form a continuous layer. Transmission electron microscopy observations showed that the sizes of the GaAs particles can be controlled from 2 to 8 nm by changing the sputtering cycle time of the GaAs target. In spite of their small size, the GaAs particles have crystallinity similar to the target material without substrate heating or postannealing. The optical absorption spectra of the GaAs particles show a blue shift as large as 1.6 eV, corresponding to strong quantum confinement of electrons and holes.

Original languageEnglish
Pages (from-to)3483
Number of pages1
JournalApplied Physics Letters
Publication statusPublished - 1995
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)


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