Synthesis, nanoindentation and AFM studies of CVD boron carbon nitride films

M. L. Kosinova; N. I. Fainer; V. S. Sulyaeva; Yu M. Rumyantsev; F. A. Kuznetsov; E. A. Maximovskii; Z. Cao; M. Terauchi; K. Shibata; F. Satoh

Synthesis, nanoindentation and AFM studies of CVD boron carbon nitride films

M. L. Kosinova, N. I. Fainer, V. S. Sulyaeva, Yu M. Rumyantsev, F. A. Kuznetsov, E. A. Maximovskii, Z. Cao, M. Terauchi, K. Shibata, F. Satoh

Research output: Contribution to conference › Paper › peer-review

7 Citations (Scopus)

Abstract

Boron carbonitride films were deposited on silicon wafers by low pressure chemical vapor deposition from gaseous mixture of trimethylamino borane (TMAB) or triethylamino borane (TEAB) complexes and ammonia, nitrogen or helium. BC_xN_y films with different composition were obtained by varying composition of initial gas mixture and deposition temperature. Ellipsometry, IR spectroscopy, scanning electron microscopy (SEM), atomic force microscopy (AFM), Auger spectroscopy, high resolution transmittance electron microscopy (HREM), X-ray diffraction using synchrotron radiation were used for film characterization. BC_xN_y films with microhardness up to 40 GPa was synthesized.

Original language	English
Pages	1082-1087
Number of pages	6
Publication status	Published - 2005 Dec 1
Event	15th European Conference on Chemical Vapor Deposition, EUROCVD-15 - Bochum, Germany Duration: 2005 Sep 5 → 2005 Sep 9

Other

Other	15th European Conference on Chemical Vapor Deposition, EUROCVD-15
Country/Territory	Germany
City	Bochum
Period	05/9/5 → 05/9/9

ASJC Scopus subject areas

Engineering(all)

Cite this

Synthesis, nanoindentation and AFM studies of CVD boron carbon nitride films. / Kosinova, M. L.; Fainer, N. I.; Sulyaeva, V. S.; Rumyantsev, Yu M.; Kuznetsov, F. A.; Maximovskii, E. A.; Cao, Z.; Terauchi, M.; Shibata, K.; Satoh, F.

2005. 1082-1087 Paper presented at 15th European Conference on Chemical Vapor Deposition, EUROCVD-15, Bochum, Germany.

Research output: Contribution to conference › Paper › peer-review

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title = "Synthesis, nanoindentation and AFM studies of CVD boron carbon nitride films",

abstract = "Boron carbonitride films were deposited on silicon wafers by low pressure chemical vapor deposition from gaseous mixture of trimethylamino borane (TMAB) or triethylamino borane (TEAB) complexes and ammonia, nitrogen or helium. BCxNy films with different composition were obtained by varying composition of initial gas mixture and deposition temperature. Ellipsometry, IR spectroscopy, scanning electron microscopy (SEM), atomic force microscopy (AFM), Auger spectroscopy, high resolution transmittance electron microscopy (HREM), X-ray diffraction using synchrotron radiation were used for film characterization. BCxNy films with microhardness up to 40 GPa was synthesized.",

author = "Kosinova, {M. L.} and Fainer, {N. I.} and Sulyaeva, {V. S.} and Rumyantsev, {Yu M.} and Kuznetsov, {F. A.} and Maximovskii, {E. A.} and Z. Cao and M. Terauchi and K. Shibata and F. Satoh",

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T1 - Synthesis, nanoindentation and AFM studies of CVD boron carbon nitride films

AU - Kosinova, M. L.

AU - Fainer, N. I.

AU - Sulyaeva, V. S.

AU - Rumyantsev, Yu M.

AU - Kuznetsov, F. A.

AU - Maximovskii, E. A.

AU - Cao, Z.

AU - Terauchi, M.

AU - Shibata, K.

AU - Satoh, F.

PY - 2005/12/1

Y1 - 2005/12/1

N2 - Boron carbonitride films were deposited on silicon wafers by low pressure chemical vapor deposition from gaseous mixture of trimethylamino borane (TMAB) or triethylamino borane (TEAB) complexes and ammonia, nitrogen or helium. BCxNy films with different composition were obtained by varying composition of initial gas mixture and deposition temperature. Ellipsometry, IR spectroscopy, scanning electron microscopy (SEM), atomic force microscopy (AFM), Auger spectroscopy, high resolution transmittance electron microscopy (HREM), X-ray diffraction using synchrotron radiation were used for film characterization. BCxNy films with microhardness up to 40 GPa was synthesized.

AB - Boron carbonitride films were deposited on silicon wafers by low pressure chemical vapor deposition from gaseous mixture of trimethylamino borane (TMAB) or triethylamino borane (TEAB) complexes and ammonia, nitrogen or helium. BCxNy films with different composition were obtained by varying composition of initial gas mixture and deposition temperature. Ellipsometry, IR spectroscopy, scanning electron microscopy (SEM), atomic force microscopy (AFM), Auger spectroscopy, high resolution transmittance electron microscopy (HREM), X-ray diffraction using synchrotron radiation were used for film characterization. BCxNy films with microhardness up to 40 GPa was synthesized.

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T2 - 15th European Conference on Chemical Vapor Deposition, EUROCVD-15

Y2 - 5 September 2005 through 9 September 2005

ER -

Synthesis, nanoindentation and AFM studies of CVD boron carbon nitride films

Abstract

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ASJC Scopus subject areas

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