Synthesis, nanoindentation and AFM studies of CVD boron carbon nitride films

M. L. Kosinova, N. I. Fainer, V. S. Sulyaeva, Yu M. Rumyantsev, F. A. Kuznetsov, E. A. Maximovskii, Z. Cao, M. Terauchi, K. Shibata, F. Satoh

Research output: Contribution to conferencePaperpeer-review

4 Citations (Scopus)

Abstract

Boron carbonitride films were deposited on silicon wafers by low pressure chemical vapor deposition from gaseous mixture of trimethylamino borane (TMAB) or triethylamino borane (TEAB) complexes and ammonia, nitrogen or helium. BCxNy films with different composition were obtained by varying composition of initial gas mixture and deposition temperature. Ellipsometry, IR spectroscopy, scanning electron microscopy (SEM), atomic force microscopy (AFM), Auger spectroscopy, high resolution transmittance electron microscopy (HREM), X-ray diffraction using synchrotron radiation were used for film characterization. BCxNy films with microhardness up to 40 GPa was synthesized.

Original languageEnglish
Pages1082-1087
Number of pages6
Publication statusPublished - 2005 Dec 1
Event15th European Conference on Chemical Vapor Deposition, EUROCVD-15 - Bochum, Germany
Duration: 2005 Sep 52005 Sep 9

Other

Other15th European Conference on Chemical Vapor Deposition, EUROCVD-15
CountryGermany
CityBochum
Period05/9/505/9/9

ASJC Scopus subject areas

  • Engineering(all)

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