Synthesis, nanoindentation and AFM studies of CVD boron carbon nitride films

M. L. Kosinova, N. I. Fainer, V. S. Sulyaeva, Yu M. Rumyantsev, F. A. Kuznetsov, E. A. Maximovskii, Z. Cao, M. Terauchi, K. Shibata, F. Satoh

    Research output: Contribution to conferencePaperpeer-review

    7 Citations (Scopus)

    Abstract

    Boron carbonitride films were deposited on silicon wafers by low pressure chemical vapor deposition from gaseous mixture of trimethylamino borane (TMAB) or triethylamino borane (TEAB) complexes and ammonia, nitrogen or helium. BCxNy films with different composition were obtained by varying composition of initial gas mixture and deposition temperature. Ellipsometry, IR spectroscopy, scanning electron microscopy (SEM), atomic force microscopy (AFM), Auger spectroscopy, high resolution transmittance electron microscopy (HREM), X-ray diffraction using synchrotron radiation were used for film characterization. BCxNy films with microhardness up to 40 GPa was synthesized.

    Original languageEnglish
    Pages1082-1087
    Number of pages6
    Publication statusPublished - 2005 Dec 1
    Event15th European Conference on Chemical Vapor Deposition, EUROCVD-15 - Bochum, Germany
    Duration: 2005 Sep 52005 Sep 9

    Other

    Other15th European Conference on Chemical Vapor Deposition, EUROCVD-15
    Country/TerritoryGermany
    CityBochum
    Period05/9/505/9/9

    ASJC Scopus subject areas

    • Engineering(all)

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