Abstract
EuO thin films have been formed by reactive evaporation, in which O2 gas was introduced in the form of a molecular beam directed toward a substrate. In order to optimize preparation conditions, we varied the substrate temperature, Ts. and the ratio of the Eu vapor to O2 gas deposition rates. R. The structure and magnetic properties of the films were measured by X-ray diffraction and a super-conducting interference device (SQUID) magnetometer. Non-stoichiometric EuO films can be produced more easily at Ts = 200°C than at Ts -300°C. Choosing an appropriate value of R at Ts = 200°C, we obtain Eu-rich EuO films with the Curie temperature of about 150 K. The present method is based on the control of reaction kinetics, and is superior to the post-oxidation method of Eu-metals with respect to the formation of Eu-rich EuO films.
Original language | English |
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Pages (from-to) | 6052-6056 |
Number of pages | 5 |
Journal | Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers |
Volume | 35 |
Issue number | 12 A |
DOIs | |
Publication status | Published - 1996 Dec |
Keywords
- Europium oxide
- Magnetic properties
- Reactive evaporation
- Thin film
- X-ray diffraction
ASJC Scopus subject areas
- Engineering(all)
- Physics and Astronomy(all)