Synchrotron radiation photoemission and infrared spectroscopy study of adsorption and decomposition of dichlorosilane on Si(100)(2 x 1)

Nozomu Kamakura, Masanori Shinohara, Hayato Watanabe, Takayuki Kuwano, Akio Seyama, Yasuo Kimura, Michio Niwano

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

We have used synchrotron radiation photoemission (SR-PES) and infrared absorption spectroscopy (IRAS) to investigate in situ the adsorption and decomposition of SiH2Cl2 on Si(100)(2 x 1). Si 2p core level photoemission spectra and IRAS spectra in the Si-H stretching vibration region of the surface exposed to SiH2Cl2 at room temperature have been measured to elucidate how SiH2Cl2 adsorbs on the surface. PES data show that monochloride (SiCl) and hydride species (SiHx) are generated upon dichlorosilane adsorption. IRAS data demonstrate that at initial stages of SiH2Cl2 adsorption, the monohydride, the dihydride (SiH2) and the Cl-substituted hydride (-SiHCl) are populated on the surface. Comparison of PES and IRAS data indicates that Si-Cl bonds of the SiH2Cl2 molecule are readily ruptured upon adsorption of dichlorosilane on the Si(100)(2 x 1).

Original languageEnglish
Pages (from-to)803-808
Number of pages6
JournalSurface Review and Letters
Volume9
Issue number2
DOIs
Publication statusPublished - 2002 Apr 1

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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