Synchrotron radiation induced reactions of condensed layer of organosilicon compounds

Michio Niwano, Jun Ichi Sawahata, Taka Aki Miura, Daisei Shoji, Nobuo Miyamoto

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

We have studied the synchrotron radiation (SR) induced chemical reactions of condensed layers of silicon alkoxides, Si(OCH3)4 and Si(OC2H5)4, and tetramethylsilane Si(CH3)4 on a Si substrate at 80 K. Photon-stimulated desorption (PSD) measurements show that irradiation with SR in the vacuum-ultraviolet (VUV) region initiates the desorption of H2, hydrocarbons, and CO from the condensed layer, indicating that VUV-SR decomposes the alkoxyl and methyl groups of the organosilicon compounds. It is found that the kinetics of desorption of CO differs from that of hydrogen and hydrocarbons. Infrared and photoemission data demonstrate that Si-containing fragments produced by the decomposition of organosilicon molecules are polymerized to generate SiO2 and amorphous SiC.

Original languageEnglish
Pages (from-to)89-92
Number of pages4
JournalJournal of Electron Spectroscopy and Related Phenomena
Volume80
DOIs
Publication statusPublished - 1996 Jan 1

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Radiation
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Spectroscopy
  • Physical and Theoretical Chemistry

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