Surface plasmon resonant interference nanolithography technique

Xiangang Luo, Teruya Ishihara

Research output: Contribution to journalArticlepeer-review

499 Citations (Scopus)

Abstract

A nanofabrication method, used to fabricate fine patterns beyond the diffraction limit, by employing surface plasmon polariton (SPP) resonance was analyzed. Surface plasmon polaritonic interference in the optical near field excited by a wavelength of 436 nm was used to pattern photolithographically the sub-100 mm lines. For arbitrary patterning, the unperforated metallic mask approach which has corrugated surfaces on both sides was proposed. It was found that the near-field pattern can be optimized by changing the parameters of the mask to generate arrays of features with the smallest lateral dimensions.

Original languageEnglish
Pages (from-to)4780-4782
Number of pages3
JournalApplied Physics Letters
Volume84
Issue number23
DOIs
Publication statusPublished - 2004 Jun 7
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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