Surface plasmon characterization of positive-tone photoimaging in polymer Langmuir-Blodgett films

Masaya Mitsuishi, Tiesheng Li, Tokuji Miyashita

    Research output: Contribution to journalArticlepeer-review

    5 Citations (Scopus)

    Abstract

    The surface plasmon technique was used to precisely and simultaneously record photopattern formation of p(DDA-tBVPC53) LB films. Minute changes in thickness were traced on the nanometer level. Thickness changed gradually during deep UV irradiation in air atmosphere. Combining this finding with spectroscopic observation by UV spectra gave detailed insight into photopattern formation. The etching resistance of polymer LB films was also determined.

    Original languageEnglish
    Pages (from-to)10035-10038
    Number of pages4
    JournalLangmuir
    Volume18
    Issue number25
    DOIs
    Publication statusPublished - 2002 Dec 10

    ASJC Scopus subject areas

    • Materials Science(all)
    • Condensed Matter Physics
    • Surfaces and Interfaces
    • Spectroscopy
    • Electrochemistry

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