Surface plasmon characterization of positive-tone photoimaging in polymer Langmuir-Blodgett films

Masaya Mitsuishi, Tiesheng Li, Tokuji Miyashita

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

The surface plasmon technique was used to precisely and simultaneously record photopattern formation of p(DDA-tBVPC53) LB films. Minute changes in thickness were traced on the nanometer level. Thickness changed gradually during deep UV irradiation in air atmosphere. Combining this finding with spectroscopic observation by UV spectra gave detailed insight into photopattern formation. The etching resistance of polymer LB films was also determined.

Original languageEnglish
Pages (from-to)10035-10038
Number of pages4
JournalLangmuir
Volume18
Issue number25
DOIs
Publication statusPublished - 2002 Dec 10

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Spectroscopy
  • Electrochemistry

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