Abstract
A dry surface passivation of GaAs using the combination of H2S gas with an ArF excimer laser was examined. Native oxides at the surface were etched away by laser irradiation in vacuum. By subsequent laser irradiation in a H2S gas ambient, the surface was covered with sulfur atoms. The dry passivation technique in this study is comparable to the wet passivation process using (NH4)2Sx treatment in terms of the sulfur coverage ratio.
| Original language | English |
|---|---|
| Pages (from-to) | 3035-3037 |
| Number of pages | 3 |
| Journal | Applied Physics Letters |
| Volume | 63 |
| Issue number | 22 |
| DOIs | |
| Publication status | Published - 1993 Dec 1 |
| Externally published | Yes |
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)
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Yoshida, N., Chichibu, S., Akane, T., Totsuka, M., Uji, H., Matsumoto, S., & Higuchi, H. (1993). Surface passivation of GaAs using ArF excimer laser in a H2S gas ambient. Applied Physics Letters, 63(22), 3035-3037. https://doi.org/10.1063/1.110250