The nitridation of c-plane sapphire substrates by near-atmospheric nitrogen plasma was investigated. The nitridation was carried out by irradiating the substrates directly (direct plasma) and remotely (remote plasma) with a flow of 400 sccm of generated nitrogen species at room temperature. After nitridation, the substrates maintained a clear step-and-terrace structure. X-ray photoelectron spectroscopy revealed clear differences in nitridation between the direct and remote plasma treatments. The substrate irradiated by the remote plasma showed mostly surface nitrogen termination, whereas the substrate irradiated by the direct plasma included numerous Al-N and O-N bonds.
ASJC Scopus subject areas
- Physics and Astronomy(all)