Surface modification without desorption: Recycling of Cl on Si(100)-(2 × 1)

Koji S. Nakayama, E. Graugnard, J. H. Weaver

Research output: Contribution to journalArticle

27 Citations (Scopus)

Abstract

Chlorine-induced modification of Si(100)-(2×1) was demonstrated under conditions where Cl was recycled rather than desorbed on SiCl2. A dimer with 2SiCl, 2Cl atoms, converted to Si + SiCl2, allowing the bare Si atom to escape. The SiCl2 unit decayed through Cl diffusion at temperature below the desorption threshold allowing the second Si atom to escape. The result was terrace region with structures, a dimer vacancy and Cl. Access to this low energy pathway was controlled by Cl concentration and temperature.

Original languageEnglish
Article number125508
Pages (from-to)1255081-1255084
Number of pages4
JournalPhysical review letters
Volume88
Issue number12
Publication statusPublished - 2002 Mar 25

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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    Nakayama, K. S., Graugnard, E., & Weaver, J. H. (2002). Surface modification without desorption: Recycling of Cl on Si(100)-(2 × 1). Physical review letters, 88(12), 1255081-1255084. [125508].