Surface modification of PDMS films by exposure to vacuum ultraviolet light and its novel application [I] - Transcription of ink based on hydrophilic/ hydrophobic surfaces

Motohiro Tagaya; Masaru Nakagawa; Tomokazu Iyoda

Surface modification of PDMS films by exposure to vacuum ultraviolet light and its novel application [I] - Transcription of ink based on hydrophilic/ hydrophobic surfaces

Motohiro Tagaya, Masaru Nakagawa, Tomokazu Iyoda

Research output: Contribution to conference › Paper › peer-review

Abstract

In this study, we investigated the effect of exposure to vacuum ultraviolet light (VUV) at 172 nm on a surface of a PDMS resin film by FT-IR spectroscopy, AFM, and contact angle measurement. A hydrophobic surface of the PDMS resin film became hydrophilic by VUV exposure because silanol groups and siloxane bonds were generated by photo-oxidation of Si-CH₃ groups in PDMS together with ablation. Based on the surface change of hydrophobicity to hydrophilic property, we demonstrated availability for printing technology.

Original language	English
Number of pages	1
Publication status	Published - 2005 Dec 1
Externally published	Yes
Event	54th SPSJ Annual Meeting 2005 - Yokohama, Japan Duration: 2005 May 25 → 2005 May 27

Other

Other	54th SPSJ Annual Meeting 2005
Country/Territory	Japan
City	Yokohama
Period	05/5/25 → 05/5/27

Keywords

PDMS
Photopatterning
Surface alteration
Vacuum ultraviolet light
Wettability

ASJC Scopus subject areas

Engineering(all)

Cite this

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title = "Surface modification of PDMS films by exposure to vacuum ultraviolet light and its novel application [I] - Transcription of ink based on hydrophilic/ hydrophobic surfaces",

abstract = "In this study, we investigated the effect of exposure to vacuum ultraviolet light (VUV) at 172 nm on a surface of a PDMS resin film by FT-IR spectroscopy, AFM, and contact angle measurement. A hydrophobic surface of the PDMS resin film became hydrophilic by VUV exposure because silanol groups and siloxane bonds were generated by photo-oxidation of Si-CH3 groups in PDMS together with ablation. Based on the surface change of hydrophobicity to hydrophilic property, we demonstrated availability for printing technology.",

keywords = "PDMS, Photopatterning, Surface alteration, Vacuum ultraviolet light, Wettability",

author = "Motohiro Tagaya and Masaru Nakagawa and Tomokazu Iyoda",

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note = "54th SPSJ Annual Meeting 2005 ; Conference date: 25-05-2005 Through 27-05-2005",

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T1 - Surface modification of PDMS films by exposure to vacuum ultraviolet light and its novel application [I] - Transcription of ink based on hydrophilic/ hydrophobic surfaces

AU - Tagaya, Motohiro

AU - Nakagawa, Masaru

AU - Iyoda, Tomokazu

PY - 2005/12/1

Y1 - 2005/12/1

N2 - In this study, we investigated the effect of exposure to vacuum ultraviolet light (VUV) at 172 nm on a surface of a PDMS resin film by FT-IR spectroscopy, AFM, and contact angle measurement. A hydrophobic surface of the PDMS resin film became hydrophilic by VUV exposure because silanol groups and siloxane bonds were generated by photo-oxidation of Si-CH3 groups in PDMS together with ablation. Based on the surface change of hydrophobicity to hydrophilic property, we demonstrated availability for printing technology.

AB - In this study, we investigated the effect of exposure to vacuum ultraviolet light (VUV) at 172 nm on a surface of a PDMS resin film by FT-IR spectroscopy, AFM, and contact angle measurement. A hydrophobic surface of the PDMS resin film became hydrophilic by VUV exposure because silanol groups and siloxane bonds were generated by photo-oxidation of Si-CH3 groups in PDMS together with ablation. Based on the surface change of hydrophobicity to hydrophilic property, we demonstrated availability for printing technology.

KW - PDMS

KW - Photopatterning

KW - Surface alteration

KW - Vacuum ultraviolet light

KW - Wettability

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M3 - Paper

AN - SCOPUS:33645640389

T2 - 54th SPSJ Annual Meeting 2005

Y2 - 25 May 2005 through 27 May 2005

ER -

Surface modification of PDMS films by exposure to vacuum ultraviolet light and its novel application [I] - Transcription of ink based on hydrophilic/ hydrophobic surfaces

Abstract

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Keywords

ASJC Scopus subject areas

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