Surface mapping of carrier density in a GaN wafer using a frequency-agile THz source

Seigo Ohno, Akihide Hamano, Katsuhiko Miyamoto, Chisato Suzuki, Hiromasa Ito

Research output: Contribution to journalArticlepeer-review

27 Citations (Scopus)

Abstract

We developed a method for mapping the carrier density on a semiconductor substrate surface based on terahertz (THz)-reflective measurement. Reflectivity in the THz-frequency region away from the optical phonon frequency is sensitive to the carrier density in semiconductors. However, reflectivity in the optical phonon frequency regions is around 1.0, independent of the carrier density. We developed a THz-reflective spectral imaging system using a frequency-agile, ultra-widely tunable THz source (1-40 THz). Different reflective images were obtained from GaN samples of carrier density 2.5 × 1016 cm-3, 1.0 × 1018 cm-3 and 1.5 × 1018 cm-3 using 22.7 and 26.5 THz. The image contrast reflected the GaN crystals' carrier density.

Original languageEnglish
Article number9012
JournalJournal of the European Optical Society
Volume4
DOIs
Publication statusPublished - 2009

Keywords

  • Carrier density
  • GaN
  • Imaging systems
  • Terahertz spectroscopy

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

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