TY - JOUR
T1 - Surface analysis of Si/W multilayer using total reflection X-ray photoelectron spectroscopy
AU - Kawai, Jun
AU - Hayashi, Kouichi
AU - Amano, Hiroyuki
AU - Takenaka, Hisataka
AU - Kitajima, Yoshinori
N1 - Funding Information:
This work was supported in part by a Grant-in-Aid for Scientific Research from the Ministry of Education, Science and Culture, Japan, as well as by Shimadzu Science Foundation. It was performed under the approval of the Photon Factory Program Advisory Committee PF-PAC No. 96G273.
PY - 1998/3
Y1 - 1998/3
N2 - X-ray photoelectron spectra of W/Si 100 bilayers on an Si wafer are measured using a soft X-ray synchrotron beam line at the Photon Factory. The grazing incident X-rays are used to excite photoelectrons. The Si 1s and W 3d5/2 photoelectron intensities are measured as a function of the glancing angle of the incident X-ray beam. The measured angle dependence of photoelectron peak intensity is reproduced by a simulation of surface layer structure.
AB - X-ray photoelectron spectra of W/Si 100 bilayers on an Si wafer are measured using a soft X-ray synchrotron beam line at the Photon Factory. The grazing incident X-rays are used to excite photoelectrons. The Si 1s and W 3d5/2 photoelectron intensities are measured as a function of the glancing angle of the incident X-ray beam. The measured angle dependence of photoelectron peak intensity is reproduced by a simulation of surface layer structure.
KW - Grazing incidence X-rays
KW - Surface analysis
KW - Total reflection X-rays
KW - X-ray multilayer optics
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U2 - 10.1016/s0368-2048(97)00207-7
DO - 10.1016/s0368-2048(97)00207-7
M3 - Article
AN - SCOPUS:0043140202
SN - 0368-2048
VL - 88-91
SP - 787
EP - 791
JO - Journal of Electron Spectroscopy and Related Phenomena
JF - Journal of Electron Spectroscopy and Related Phenomena
ER -