Suppression of excess oxygen for environmentally stable amorphous In-Si-O thin-film transistors

Shinya Aikawa, Nobuhiko Mitoma, Takio Kizu, Toshihide Nabatame, Kazuhito Tsukagoshi

Research output: Contribution to journalArticlepeer-review

19 Citations (Scopus)

Abstract

We discuss the environmental instability of amorphous indium oxide (InOx)-based thin-film transistors (TFTs) in terms of the excess oxygen in the semiconductor films. A comparison between amorphous InOx doped with low and high concentrations of oxygen binder (SiO2) showed that out-diffusion of oxygen molecules causes drastic changes in the film conductivity and TFT turn-on voltages. Incorporation of sufficient SiO2 could suppress fluctuations in excess oxygen because of the high oxygen bond-dissociation energy and low Gibbs free energy. Consequently, the TFT operation became rather stable. The results would be useful for the design of reliable oxide TFTs with stable electrical properties.

Original languageEnglish
Article number192103
JournalApplied Physics Letters
Volume106
Issue number19
DOIs
Publication statusPublished - 2015 May 11
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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