Suppression of electron emission from cathode in photoemission-assisted Ar plasma

N. Kamata; S. Ajia; S. Ogawa; Y. Takakuwa

doi:10.1109/IVNC.2018.8520275

Suppression of electron emission from cathode in photoemission-assisted Ar plasma

N. Kamata, S. Ajia, S. Ogawa, Y. Takakuwa

Division of Measurements

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

In order to improve the efficiency of the surface flattening process using photoemission-assisted plasma ion source, current-bias voltage characteristic and Ar⁺ ions/Ar atoms ratio in the plasma was investigated. The glow discharge starting voltage decreases by UV irradiation and a great number of Ar⁺ ions were irradiated to the substrate. On the other hand in PA Townsend discharge, the number of Ar⁺ ions reached at the substrate is smaller than that in glow discharge due to space charges near the cathode substrate.

Original language	English
Title of host publication	2018 31st International Vacuum Nanoelectronics Conference, IVNC 2018
Publisher	Institute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)	9781538657171
DOIs	https://doi.org/10.1109/IVNC.2018.8520275
Publication status	Published - 2018 Nov 1
Event	31st International Vacuum Nanoelectronics Conference, IVNC 2018 - Kyoto, Japan Duration: 2018 Jul 9 → 2018 Jul 13

Publication series

Name	2018 31st International Vacuum Nanoelectronics Conference, IVNC 2018

Other

Other	31st International Vacuum Nanoelectronics Conference, IVNC 2018
Country/Territory	Japan
City	Kyoto
Period	18/7/9 → 18/7/13

Keywords

Langmuir probe
photoemission-assisted plasma
spave charge effect

ASJC Scopus subject areas

Electrical and Electronic Engineering
Industrial and Manufacturing Engineering
Electronic, Optical and Magnetic Materials

Access to Document

10.1109/IVNC.2018.8520275

Cite this

Kamata, N., Ajia, S., Ogawa, S., & Takakuwa, Y. (2018). Suppression of electron emission from cathode in photoemission-assisted Ar plasma. In 2018 31st International Vacuum Nanoelectronics Conference, IVNC 2018 [8520275] (2018 31st International Vacuum Nanoelectronics Conference, IVNC 2018). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/IVNC.2018.8520275

Suppression of electron emission from cathode in photoemission-assisted Ar plasma. / Kamata, N.; Ajia, S.; Ogawa, S.; Takakuwa, Y.

2018 31st International Vacuum Nanoelectronics Conference, IVNC 2018. Institute of Electrical and Electronics Engineers Inc., 2018. 8520275 (2018 31st International Vacuum Nanoelectronics Conference, IVNC 2018).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Kamata, N, Ajia, S , Ogawa, S & Takakuwa, Y 2018, Suppression of electron emission from cathode in photoemission-assisted Ar plasma. in 2018 31st International Vacuum Nanoelectronics Conference, IVNC 2018., 8520275, 2018 31st International Vacuum Nanoelectronics Conference, IVNC 2018, Institute of Electrical and Electronics Engineers Inc., 31st International Vacuum Nanoelectronics Conference, IVNC 2018, Kyoto, Japan, 18/7/9. https://doi.org/10.1109/IVNC.2018.8520275

Kamata N, Ajia S , Ogawa S , Takakuwa Y. Suppression of electron emission from cathode in photoemission-assisted Ar plasma. In 2018 31st International Vacuum Nanoelectronics Conference, IVNC 2018. Institute of Electrical and Electronics Engineers Inc. 2018. 8520275. (2018 31st International Vacuum Nanoelectronics Conference, IVNC 2018). https://doi.org/10.1109/IVNC.2018.8520275

@inproceedings{67a18e654f0e4370b53f97f2205bf320,

title = "Suppression of electron emission from cathode in photoemission-assisted Ar plasma",

abstract = "In order to improve the efficiency of the surface flattening process using photoemission-assisted plasma ion source, current-bias voltage characteristic and Ar+ ions/Ar atoms ratio in the plasma was investigated. The glow discharge starting voltage decreases by UV irradiation and a great number of Ar+ ions were irradiated to the substrate. On the other hand in PA Townsend discharge, the number of Ar+ ions reached at the substrate is smaller than that in glow discharge due to space charges near the cathode substrate.",

keywords = "Langmuir probe, photoemission-assisted plasma, spave charge effect",

author = "N. Kamata and S. Ajia and S. Ogawa and Y. Takakuwa",

note = "Funding Information: ACKNOWLEDGMENT This work was supported by JSPS KAKENHI Grant Number JP16K14124. Publisher Copyright: {\textcopyright} 2018 IEEE.; 31st International Vacuum Nanoelectronics Conference, IVNC 2018 ; Conference date: 09-07-2018 Through 13-07-2018",

year = "2018",

month = nov,

day = "1",

doi = "10.1109/IVNC.2018.8520275",

language = "English",

series = "2018 31st International Vacuum Nanoelectronics Conference, IVNC 2018",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

booktitle = "2018 31st International Vacuum Nanoelectronics Conference, IVNC 2018",

}

TY - GEN

T1 - Suppression of electron emission from cathode in photoemission-assisted Ar plasma

AU - Kamata, N.

AU - Ajia, S.

AU - Ogawa, S.

AU - Takakuwa, Y.

PY - 2018/11/1

Y1 - 2018/11/1

N2 - In order to improve the efficiency of the surface flattening process using photoemission-assisted plasma ion source, current-bias voltage characteristic and Ar+ ions/Ar atoms ratio in the plasma was investigated. The glow discharge starting voltage decreases by UV irradiation and a great number of Ar+ ions were irradiated to the substrate. On the other hand in PA Townsend discharge, the number of Ar+ ions reached at the substrate is smaller than that in glow discharge due to space charges near the cathode substrate.

AB - In order to improve the efficiency of the surface flattening process using photoemission-assisted plasma ion source, current-bias voltage characteristic and Ar+ ions/Ar atoms ratio in the plasma was investigated. The glow discharge starting voltage decreases by UV irradiation and a great number of Ar+ ions were irradiated to the substrate. On the other hand in PA Townsend discharge, the number of Ar+ ions reached at the substrate is smaller than that in glow discharge due to space charges near the cathode substrate.

KW - Langmuir probe

KW - photoemission-assisted plasma

KW - spave charge effect

UR - http://www.scopus.com/inward/record.url?scp=85057483558&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85057483558&partnerID=8YFLogxK

U2 - 10.1109/IVNC.2018.8520275

DO - 10.1109/IVNC.2018.8520275

M3 - Conference contribution

AN - SCOPUS:85057483558

T3 - 2018 31st International Vacuum Nanoelectronics Conference, IVNC 2018

BT - 2018 31st International Vacuum Nanoelectronics Conference, IVNC 2018

PB - Institute of Electrical and Electronics Engineers Inc.

T2 - 31st International Vacuum Nanoelectronics Conference, IVNC 2018

Y2 - 9 July 2018 through 13 July 2018

ER -

Suppression of electron emission from cathode in photoemission-assisted Ar plasma

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