Suppression of electron emission from cathode in photoemission-assisted Ar plasma

N. Kamata, S. Ajia, S. Ogawa, Y. Takakuwa

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

In order to improve the efficiency of the surface flattening process using photoemission-assisted plasma ion source, current-bias voltage characteristic and Ar+ ions/Ar atoms ratio in the plasma was investigated. The glow discharge starting voltage decreases by UV irradiation and a great number of Ar+ ions were irradiated to the substrate. On the other hand in PA Townsend discharge, the number of Ar+ ions reached at the substrate is smaller than that in glow discharge due to space charges near the cathode substrate.

Original languageEnglish
Title of host publication2018 31st International Vacuum Nanoelectronics Conference, IVNC 2018
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781538657171
DOIs
Publication statusPublished - 2018 Nov 1
Event31st International Vacuum Nanoelectronics Conference, IVNC 2018 - Kyoto, Japan
Duration: 2018 Jul 92018 Jul 13

Publication series

Name2018 31st International Vacuum Nanoelectronics Conference, IVNC 2018

Other

Other31st International Vacuum Nanoelectronics Conference, IVNC 2018
CountryJapan
CityKyoto
Period18/7/918/7/13

Keywords

  • Langmuir probe
  • photoemission-assisted plasma
  • spave charge effect

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Industrial and Manufacturing Engineering
  • Electronic, Optical and Magnetic Materials

Fingerprint Dive into the research topics of 'Suppression of electron emission from cathode in photoemission-assisted Ar plasma'. Together they form a unique fingerprint.

Cite this