TY - GEN
T1 - Suppression of electron emission from cathode in photoemission-assisted Ar plasma
AU - Kamata, N.
AU - Ajia, S.
AU - Ogawa, S.
AU - Takakuwa, Y.
N1 - Funding Information:
ACKNOWLEDGMENT This work was supported by JSPS KAKENHI Grant Number JP16K14124.
PY - 2018/11/1
Y1 - 2018/11/1
N2 - In order to improve the efficiency of the surface flattening process using photoemission-assisted plasma ion source, current-bias voltage characteristic and Ar+ ions/Ar atoms ratio in the plasma was investigated. The glow discharge starting voltage decreases by UV irradiation and a great number of Ar+ ions were irradiated to the substrate. On the other hand in PA Townsend discharge, the number of Ar+ ions reached at the substrate is smaller than that in glow discharge due to space charges near the cathode substrate.
AB - In order to improve the efficiency of the surface flattening process using photoemission-assisted plasma ion source, current-bias voltage characteristic and Ar+ ions/Ar atoms ratio in the plasma was investigated. The glow discharge starting voltage decreases by UV irradiation and a great number of Ar+ ions were irradiated to the substrate. On the other hand in PA Townsend discharge, the number of Ar+ ions reached at the substrate is smaller than that in glow discharge due to space charges near the cathode substrate.
KW - Langmuir probe
KW - photoemission-assisted plasma
KW - spave charge effect
UR - http://www.scopus.com/inward/record.url?scp=85057483558&partnerID=8YFLogxK
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U2 - 10.1109/IVNC.2018.8520275
DO - 10.1109/IVNC.2018.8520275
M3 - Conference contribution
AN - SCOPUS:85057483558
T3 - 2018 31st International Vacuum Nanoelectronics Conference, IVNC 2018
BT - 2018 31st International Vacuum Nanoelectronics Conference, IVNC 2018
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 31st International Vacuum Nanoelectronics Conference, IVNC 2018
Y2 - 9 July 2018 through 13 July 2018
ER -