Superconducting properties and phase analysis of nb-si thin films produced by sputtering

Shigetoshi Ohshima, Takashi Shiba, Tadashi Kawanobe, Tokuo Wakiyama

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

Nb-Si films were deposited on Nb84 Si16, Ti3Au and W3Re films with an A15 structure by sputtering. The films with double layers were analyzed using Auger electron spectroscopy. Phase analyses of the sputtered Nb-Si films were carried out by X-ray diffraction studies. The A15 Nb.78Si.22 and Nb.75Si.25 films were grown epitaxially on Nb.84Si.16 and W3Re substrate films. The superconducting transition temperatures of these epitaxial films were found to range between 5 and 9 K.

Original languageEnglish
Pages (from-to)1336-1341
Number of pages6
JournalJapanese journal of applied physics
Volume25
Issue number9 R
DOIs
Publication statusPublished - 1986 Sep

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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