Subwavelength antireflection gratings for photovoltaic cells in visible and near-infrared wavelengths

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

In this study, we have fabricated a two-dimensional antireflection subwavelength grating (SWG) on a GaSb substratefor application to a photovoltaic cell. The SWG has consisted of 350 nm period tapered grating. In the fabrication, electron beam (EB) lithography and fast atom beam (FAB) etching have been used. We have demonstrated that the SWG works well for reducing the reflection even at the temperature of 240°C. To our knowledge, the SWG is fabricated on the GaSb substrate for the first time.

Original languageEnglish
Title of host publication2002 International Microprocesses and Nanotechnology Conference, MNC 2002
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages182-183
Number of pages2
ISBN (Print)4891140313, 9784891140311
DOIs
Publication statusPublished - 2002
EventInternational Microprocesses and Nanotechnology Conference, MNC 2002 - Tokyo, Japan
Duration: 2002 Nov 62002 Nov 8

Other

OtherInternational Microprocesses and Nanotechnology Conference, MNC 2002
CountryJapan
CityTokyo
Period02/11/602/11/8

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering

Fingerprint Dive into the research topics of 'Subwavelength antireflection gratings for photovoltaic cells in visible and near-infrared wavelengths'. Together they form a unique fingerprint.

Cite this