Substrate temperature effects on amorphous carbon film growth, investigated by infrared spectroscopy in multiple internal reflection geometry

Masanori Shinohara, Ken Cho, Yoshinobu Matsuda, Takanori Inayoshi, Hiroki Kawazoe, Hiroshi Fujiyama, Yuuki Nitta, Tatsuyuki Nakatani

Research output: Contribution to journalArticle

20 Citations (Scopus)

Abstract

The substrate temperature effects on the amorphous carbon film growth were investigated, by using the deposition rates and in situ and "real- time" infrared spectroscopy in multiple internal reflection geometry. The deposition rates were decreased, in contrast with the increases of substrate temperature. The growth mode was also changed with substrate temperatures: the film growth depends on the gas phase reaction at low substrate temperature; on the other hand, at high temperature the film grows with the decomposition of the C H 3 species.

Original languageEnglish
Pages (from-to)813-817
Number of pages5
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume27
Issue number4
DOIs
Publication statusPublished - 2009
Externally publishedYes

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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