Substrate temperature dependence of the properties of ZAO thin films deposited by magnetron sputtering

En Gang Fu, Da Ming Zhuang, Gong Zhang, Wei Fang Yang, Ming Zhao

Research output: Contribution to journalArticle

52 Citations (Scopus)

Abstract

ZAO (ZnO:Al) transparent conductive thin films have been prepared by middle-frequency alternative magnetron sputtering with ZAO (98 wt.% ZnO + 2wt.% Al 2O 3) ceramic target. The influences of substrate temperature on the microstructure, optical, and electrical performances of ZAO films have been studied. UV-Vis and Van der Pauw investigated the visible transmittance, carrier concentration, and Hall mobility, respectively, while microstructure has been characterized by X-ray diffraction (XRD). The results show substrate temperature is a dominant factor for microstructure, optical, and electrical performances of ZAO thin films. The lowest resistivity obtained in this study was 4.6 × 10 -4 Ω cm for the film with sheet resistance of 32 Ω, which was deposited at the substrate temperature of 250 °C and operation gas pressure of 0.8 Pa.

Original languageEnglish
Pages (from-to)88-94
Number of pages7
JournalApplied Surface Science
Volume217
Issue number1-4
DOIs
Publication statusPublished - 2003 Jul 15

Keywords

  • Magnetron sputtering
  • Resistivity
  • Substrate temperature
  • Transmittance
  • ZAO thin films

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Surfaces, Coatings and Films
  • Condensed Matter Physics

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