Substrate misorientation dependence of the hexagonal phase inclusion in cubic GaN films grown by metalorganic vapor phase epitaxy

A. Nagayama, R. Katayama, N. Nakadan, K. Miwa, H. Yaguchi, J. Wu, K. Onabe, Y. Shiraki

Research output: Contribution to journalConference articlepeer-review

10 Citations (Scopus)

Abstract

The metalorganic vapor phase epitaxial (MOVPE) growth of cubic GaN layers on misoriented GaAs (001) substrates, the faces of which were tilted from (001) toward [11̄0] or [110] by 4°, was performed in order to investigate the effect of the substrate misorientation on the inclusion of hexagonal phase in the cubic GaN layer. The sample grown on the tilted surface toward [11̄0] showed an enhanced generation of the hexagonal domain on the (11̄1) face, whereas the hexagonal domain on the (1̄11) face was suppressed. The sample grown on the tilted surface toward [110] showed the generation of the hexagonal domains on both the (11̄1) and (1̄11) faces with an equal magnitude. It is suggested that the generation of hexagonal domains may be suppressed when the exposure of the (11̄1) or (1̄11) faces by the thermal damage of the substrate surface is reduced.

Original languageEnglish
Pages (from-to)513-517
Number of pages5
JournalPhysica Status Solidi (A) Applied Research
Volume176
Issue number1
DOIs
Publication statusPublished - 1999 Nov
EventProceedings of the 1999 3rd International Conference on Nitride Semiconductors (ICNS'99) - Montpellier, France
Duration: 1999 Jul 41999 Jul 9

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

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